Benchmarking of software tools for optical proximity correction

Angelika Jungmann; Joerg Thiele; Christoph M. Friedrich; Rainer Pforr; Wilhelm Maurer

doi:10.1117/12.310721

29 June 1998 Benchmarking of software tools for optical proximity correction

Angelika Jungmann, Joerg Thiele, Christoph M. Friedrich, Rainer Pforr, Wilhelm Maurer

Proceedings Volume 3334, Optical Microlithography XI; (1998) https://doi.org/10.1117/12.310721
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

The point when optical proximity correction (OPC) will become a routine procedure for every design is not far away. For such a daily use the requirements for an OPC tool go far beyond the principal functionality of OPC that was proven by a number of approaches and is documented well in literature. In this paper we first discuss the requirements for a productive OPC tool. Against these requirements a benchmarking was performed with three different OPC tools available on market (OPRX from TVT, OPTISSIMO from aiss and PROTEUS from TMA). Each of these tools uses a different approach to perform the correction (rules, simulation or model). To assess the accuracy of the correction, a test chip was fabricated, which contains corrections done by each software tool. The advantages and weakness of the several solutions are discussed.

Citation Download Citation

Angelika Jungmann, Joerg Thiele, Christoph M. Friedrich, Rainer Pforr, and Wilhelm Maurer "Benchmarking of software tools for optical proximity correction", Proc. SPIE 3334, Optical Microlithography XI, (29 June 1998); https://doi.org/10.1117/12.310721

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