Built-in lens mask lithography: challenge for high definition lens-less lithography

Naoki Ueda; Masaru Sasago; Akio Misaka; Hisao Kikuta; Hiroaki Kawata; Yoshihiko Hirai

doi:10.1117/12.2065251

28 July 2014 Built-in lens mask lithography: challenge for high definition lens-less lithography

Naoki Ueda, Masaru Sasago, Akio Misaka, Hisao Kikuta, Hiroaki Kawata, Yoshihiko Hirai

Proceedings Volume 9256, Photomask and Next-Generation Lithography Mask Technology XXI; 92560A (2014) https://doi.org/10.1117/12.2065251
Event: Photomask Japan 2014, 2014, Yokohama, Japan

Abstract

Novel photo-lithography is newly proposed named built-in lens mask lithography. The method emulates optical propagation plane in exposure system using binary transmittance and phase mask instead of projection lens. The performance of the built-in lens mask lithography is studied by numerical simulation and experimental study using conventional proximity exposure system. The result shows resolution enhancement in deep focus plane.

Citation Download Citation

Naoki Ueda, Masaru Sasago, Akio Misaka, Hisao Kikuta, Hiroaki Kawata, and Yoshihiko Hirai "Built-in lens mask lithography: challenge for high definition lens-less lithography", Proc. SPIE 9256, Photomask and Next-Generation Lithography Mask Technology XXI, 92560A (28 July 2014); https://doi.org/10.1117/12.2065251

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