State-of-the-art pattern registration tools have to fulfill stringent requirements both in terms of reproducibility and
accuracy, as photomask sets are often fabricated in a distributed fashion worldwide and yet have to perfectly match in
their respective overlay properties. One option to calibrate the various metrology tools with respect to each other is to
utilize a standard, a "golden mask." Alternatively, "self-calibration" strategies can be employed, which offer certain
distinct advantages. This concept of calibration is illustrated by several examples. Merit functions are defined to compare
the quality of the calibration procedures, and it is shown how they can be used to optimize the calibration with respect to
its efficiency in filtering measurement noise. A symmetry based analysis is introduced to reveal systematic weaknesses
of potential calibration sequences, also indicating the necessary steps to overcome these problems. An extension of the
theory is given that allows to suppress a certain class of systematical errors, and it is studied under which conditions it
can be applied.
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