Prof. Andrew D. L. Humphris Profile

Prof. Andrew D. L. Humphris

CTO at Infinitesima Ltd

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Publications (6)

Proceedings Article | 12 November 2024 Presentation + Paper

Enhancing lithography precision: characterizing resist profiles in semiconductor manufacturing with rapid probe microscopy

L. Feng, V. Panchal, R. Thorogate, J. Robinson, J. Cossins, A. D. Humphris, V. Vaenkatesan, J. Finders

Proceedings Volume 13215, 132150A (2024) https://doi.org/10.1117/12.3034551

KEYWORDS: Critical dimension metrology, Lithography, Matrices, Finite element methods, Coating thickness, Atomic force microscopy, 3D metrology, Semiconductor manufacturing, Microscopy, Metrology

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Proceedings Article | 22 February 2021 Presentation + Paper

An innovative probe microscopy solution for measuring conductivity profiles in 3-dimensions

U. Celano, K. Paredis, A. D. L. Humphris, M. Tedaldi, C. O'Sullivan, J. P. Hole, J. Goulden

Proceedings Volume 11611, 116110J (2021) https://doi.org/10.1117/12.2583065

KEYWORDS: 3D metrology, Microscopy, Metrology, Switching, Tomography, Semiconductor manufacturing, Gallium arsenide, Diamond, 3D equipment, Transmission electron microscopy

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Proceedings Article | 20 March 2020 Paper

The application of a Rapid Probe Microscope (RPM) for investigating 1D and 2D structures from EUV lithography

Andrew D. Humphris, Alain Moussa, Mircea Dusa, Anne-Laure Charley, Elis Newham, Jenny Goulden, Lei Feng, Christopher Bevis

Proceedings Volume 11325, 113251M (2020) https://doi.org/10.1117/12.2552054

KEYWORDS: 3D image processing, Extreme ultraviolet lithography, Microscopes, 3D metrology, Extreme ultraviolet, Data analysis, Metrology, Statistical analysis, Finite element methods, Microscopy

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Proceedings Article | 20 March 2020 Paper

A novel high throughput probe microscope: for measuring 3D structures, designed for in-line, integrated or standalone operation

A.D. Humphris, L. Feng, M. Tedaldi, L. Mudarikwa, D. Ockwell, J. Goulden

Proceedings Volume 11325, 113252H (2020) https://doi.org/10.1117/12.2551693

KEYWORDS: Microscopes, Image quality, Photomasks, Metrology, 3D metrology, Manufacturing, Semiconducting wafers, Line edge roughness, Chemical mechanical planarization, Structural design

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Proceedings Article | 18 March 2016 Paper

Probe microscopy for metrology of next generation devices

Andrew D. Humphris, Bin Zhao, David Bastard, Benjamin Bunday

Proceedings Volume 9778, 97782L (2016) https://doi.org/10.1117/12.2219035

KEYWORDS: Metrology, Microscopes, Process control, Critical dimension metrology, Atomic force microscopy, Image processing, Microscopy, Transistors, Semiconducting wafers, Atomic force microscope, Scanning electron microscopy, 3D metrology, Semiconductors, High volume manufacturing, Nondestructive evaluation

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Proceedings Article | 20 April 2011 Paper

High-speed atmospheric imaging of semiconductor wafers using rapid probe microscopy

Priyanka Kohli, Jeff Lyons, Andrew D. L. Humphris, Benjamin D. Bunday, Abraham Arceo, Akira Hamaguchi, Dilip Patel, David Bakker

Proceedings Volume 7971, 797119 (2011) https://doi.org/10.1117/12.879456

KEYWORDS: Semiconducting wafers, Image processing, Copper, Microscopy, Scanning electron microscopy, Safety, Semiconductors, Chemical mechanical planarization, Etching, Neodymium

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Showing 5 of 6 publications

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