Mr. Daniel Chalom Profile

Daniel Chalom

Director of Technical Marketing

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Author

Publications (5)

Proceedings Article | 20 October 2016 Paper

Mask manufacturing of advanced technology designs using multi-beam lithography (Part 1)

Michael Green, Young Ham, Brian Dillon, Bryan Kasprowicz, Ik Boum Hur, Joong Hee Park, Yohan Choi, Jeff McMurran, Henry Kamberian, Daniel Chalom, Jan Klikovits, Michal Jurkovic, Peter Hudek

Proceedings Volume 10032, 1003205 (2016) https://doi.org/10.1117/12.2247941

KEYWORDS: Photomasks, Manufacturing, Optical proximity correction, SRAF, Inspection, Metals, Optics manufacturing, Scanning electron microscopy, Logic, Lithography

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Proceedings Article | 26 September 2016 Paper

Mask manufacturing of advanced technology designs using multi-beam lithography (part 2)

Michael Green, Young Ham, Brian Dillon, Bryan Kasprowicz, Ik Boum Hur, Joong Hee Park, Yohan Choi, Jeff McMurran, Henry Kamberian, Daniel Chalom, Jan Klikovits, Michal Jurkovic, Peter Hudek

Proceedings Volume 9985, 99850R (2016) https://doi.org/10.1117/12.2243407

KEYWORDS: Photomasks, SRAF, Optical proximity correction, Logic, Manufacturing, Metals, Inspection, Image processing, Information operations, Scanning electron microscopy

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Proceedings Article | 9 July 2015 Paper

Investigation of local registration performance of IMS Nanofabrication’s Multi-Beam Mask Writer

Daniel Chalom, Jan Klikovits, David Geist, Peter Hudek, Stefan Eder-Kapl, Mehdi Daneshpanah, Frank Laske, Stefan Eyring, Klaus-Dieter Roeth

Proceedings Volume 9658, 965805 (2015) https://doi.org/10.1117/12.2196388

KEYWORDS: Photomasks, Metrology, Image registration, Nanofabrication, Calibration, Reticles, Beam shaping, Manufacturing, Lithography, Model-based design

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Proceedings Article | 30 September 2009 Paper

Critical dimension uniformity using reticle inspection tool

Mark Wylie, Trent Hutchinson, Gang Pan, Thomas Vavul, John Miller, Aditya Dayal, Carl Hess, Mike Green, Shad Hedges, Dan Chalom, Maciej Rudzinski, Craig Wood, Jeff McMurran

Proceedings Volume 7488, 74881O (2009) https://doi.org/10.1117/12.830148

KEYWORDS: Photomasks, Reticles, Scanning electron microscopy, Critical dimension metrology, Inspection, Manufacturing, Etching, Error analysis, Semiconducting wafers, Binary data

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Proceedings Article | 11 May 2009 Paper

Haze growth on reticles: What's the RigHT thing to do?

Steven McDonald, Daniel Chalom, Michael Green, Jeffrey McMurran, Michael Garrett, David Dlouhy

Proceedings Volume 7379, 73790F (2009) https://doi.org/10.1117/12.824256

KEYWORDS: Reticles, Air contamination, Photomasks, Semiconducting wafers, Inspection, Wafer inspection, Semiconductors, Pellicles, Scanners, Manufacturing

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