Mr. Hidetoshi Oishi Profile

Hidetoshi Oishi

at Sony Corp

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Publications (3)

Proceedings Article | 15 May 2007 Paper

New OPC method for contact layer to expand process margin

Mikio Oka, Hidetoshi Oishi, Kensuke Tsuchiya, Hidetoshi Ohnuma

Proceedings Volume 6607, 660732 (2007) https://doi.org/10.1117/12.729021

KEYWORDS: Optical proximity correction, Critical dimension metrology, Image processing, Lithography, Semiconductors, Optical calibration, Photomasks, Resolution enhancement technologies, Photoresist processing

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Proceedings Article | 14 May 2007 Paper

New method to estimate systematic yield caused by lithography manufacturability

Hidetoshi Oishi, Mikio Oka, Kensuke Tsuchiya, Kazuhisa Ogawa, Hidetoshi Ohnuma

Proceedings Volume 6607, 660719 (2007) https://doi.org/10.1117/12.728957

KEYWORDS: Optical proximity correction, Metals, Design for manufacturing, Lithography, Manufacturing, Failure analysis, Yield improvement, Image processing, Error analysis, Photomasks

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Proceedings Article | 28 June 2005 Paper

An extension method of metal layer layout in mask data preparation for robust processes

Kensuke Tsuchiya, Kazuhisa Ogawa, Satomi Nakamura, Kazuyoshi Kawahara, Hidetoshi Oishi, Hidetoshi Ohnuma

Proceedings Volume 5853, (2005) https://doi.org/10.1117/12.617135

KEYWORDS: Optical proximity correction, Photomasks, Metals, Printing, Semiconductors, SRAF, Lithography, Scanners, Design for manufacturing, Design for manufacturability

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