Mr. Hitoshi Nakano Profile

Hitoshi Nakano

Manager at Canon Inc

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 22 March 2016 Paper

Defectivity and particle reduction for mask life extension, and imprint mask replication for high-volume semiconductor manufacturing

Keiji Emoto, Fumio Sakai, Chiaki Sato, Yukio Takabayashi, Hitoshi Nakano, Tsuneo Takabayashi, Kiyohito Yamamoto, Tadashi Hattori, Mitsuru Hiura, Toshiaki Ando, Yoshio Kawanobe, Hisanobu Azuma, Takehiko Iwanaga, Jin Choi, Ali Aghili, Chris Jones, J. W. Irving, Brian Fletcher, Zhengmao Ye

Proceedings Volume 9777, 97770C (2016) https://doi.org/10.1117/12.2219036

KEYWORDS: Photomasks, Particles, Nanoimprint lithography, Lithography, Semiconductors, Control systems, Semiconductor manufacturing, Ultraviolet radiation, Optical lithography, Dry etching, Semiconducting wafers, Curtains, Liquids, Ceramics, Overlay metrology

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Proceedings Article | 7 March 2008 Paper

Immersion defect performance and particle control method for 45nm mass production

Takahito Chibana, Masamichi Kobayashi, Hitoshi Nakano, Mikio Arakawa, Yoichi Matsuoka, Youji Kawasaki, Masayuki Tanabe, Hirohisa Oda

Proceedings Volume 6924, 69241B (2008) https://doi.org/10.1117/12.774672

KEYWORDS: Semiconducting wafers, Particles, Contamination, Inspection, Scanning probe microscopy, Bridges, Liquids, Water, Deep ultraviolet, Defect inspection

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Proceedings Article | 7 March 2008 Paper

Performance of the FPA-7000AS7 1.35 NA immersion exposure system for 45-nm mass production

Keiji Yoshimura, Hitoshi Nakano, Hideo Hata, Nobuyoshi Deguchi, Masamichi Kobayashi, Takeaki Ebihara, Yoshio Kawanobe, Tsuneo Kanda

Proceedings Volume 6924, 69241O (2008) https://doi.org/10.1117/12.771876

KEYWORDS: Semiconducting wafers, Particles, Distortion, Liquids, Inspection, Bridges, Polarization, Thin film coatings, Scanning probe microscopy, Overlay metrology

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Proceedings Article | 26 March 2007 Paper

Contamination and particle control system in immersion exposure tool

Masamichi Kobayashi, Hitoshi Nakano, Mikio Arakawa, Masayuki Tanabe, Koji Toyoda, Takahito Chibana, Yoichi Matsuoka, Youji Kawasaki

Proceedings Volume 6520, 652014 (2007) https://doi.org/10.1117/12.711289

KEYWORDS: Particles, Contamination, Semiconducting wafers, Bridges, Defect inspection, Water, Inspection, Pulsed laser operation, Control systems, Transmittance

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Proceedings Article | 11 April 2006 Paper

Analysis of 193nm immersion specific defects

Akihiko Otoguro, Jeung-Woo Lee, Toshiro Itani, Kiyoshi Fujii, Tomohiro Funakoshi, Tsunehiro Sakai, Kenji Watanabe, Mikio Arakawa, Hitoshi Nakano, Masamichi Kobayashi

Proceedings Volume 6153, 61531P (2006) https://doi.org/10.1117/12.656086

KEYWORDS: Photoresist processing, Bridges, Semiconducting wafers, Scanning electron microscopy, Photography, Immersion lithography, Thin film coatings, Lithography, Crystals, Quartz

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Proceedings Article | 15 March 2006 Paper

Development status of a 193-nm immersion exposure tool

Takahito Chibana, Hitoshi Nakano, Hideo Hata, Nobuhiro Kodachi, Naoto Sano, Mikio Arakawa, Yoichi Matsuoka, Youji Kawasaki, Sunao Mori, Keiko Chiba

Proceedings Volume 6154, 61541V (2006) https://doi.org/10.1117/12.657010

KEYWORDS: Contamination, Semiconducting wafers, Transmittance, Immersion lithography, Defect inspection, Water, Liquids, Particles, Laser irradiation, Scanners

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Proceedings Article | 12 May 2005 Paper

Development of ArF immersion exposure tool

Hitoshi Nakano, Hideo Hata, Kazuhiro Takahashi, Mikio Arakawa, Takahito Chibana, Tokuyuki Honda, Keiko Chiba, Sunao Mori

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.600492

KEYWORDS: Semiconducting wafers, Water, Contamination, Control systems, Immersion lithography, Scanners, Transmittance, Temperature metrology, Optical lithography, Microfluidics

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Proceedings Article | 28 May 2004 Paper

Evaluation systems of F2 laser lithography materials

Yasuo Itakura, Youichi Kawasa, Keiji Egawa, Akira Sumitani, Hironao Sasaki, Iwao Higasikawa, Shigeo Irie, Kiyoshi Fujii, Toshiro Itani, Hitoshi Nakano, Hideo Hata

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.534839

KEYWORDS: Transmittance, Pellicles, Photomasks, Fluorine, Lithography, Laser irradiation, Semiconducting wafers, Vacuum ultraviolet, Contamination, Laser development

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Proceedings Article | 26 June 2003 Paper

Development status of a 157-nm full-field scanner

Hitoshi Nakano, Hideo Hata, Hideki Nogawa, Nobuyoshi Deguchi, Michio Kohno, Yuji Chiba

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485509

KEYWORDS: Projection systems, Semiconducting wafers, Oxygen, Reticles, Optical coatings, Transmittance, Birefringence, Crystals, Scanners, Helium

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Proceedings Article | 5 July 2000 Paper

193-nm step-and-scan lithography equipment

Naoto Sano, Kazuhiro Takahashi, Hitoshi Nakano, Akiyoshi Suzuki

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389041

KEYWORDS: Lithography, Scanners, Semiconducting wafers, Projection systems, Excimer lasers, Lithographic illumination, Distortion, Optical alignment, Laser development, Light sources

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Showing 5 of 10 publications

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