Dr. I-Yuan Wan Profile

Dr. I-Yuan Wan

at Rohm And Haas Electronic Materials Asia Pacific Co

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Author

Publications (2)

Proceedings Article | 20 March 2015 Paper

Top-coatless 193nm positive-tone development immersion resist for logic application

Lian Cong Liu, Tsung Ju Yeh, Yeh-Sheng Lin, Yu Chin Huang, Chien Wen Kuo, Wen Liang Huang, Chia Hung Lin, Chun Chi Yu, Ray Hsu, I-Yuan Wan, Jeff Lin, Kwang-Hwyi Im, Hae Jin Lim, Hyun Jeon, Yasuhiro Suzuki, Cheng Bai Xu

Proceedings Volume 9425, 94251T (2015) https://doi.org/10.1117/12.2086348

KEYWORDS: Polymers, Lithography, Photoresist processing, Diffusion, Logic, Photoresist materials, 193nm lithography, Photoresist developing, Photomasks, Polymerization

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Proceedings Article | 29 March 2006 Paper

Process development and resist modification for metal trench layers from 65nm to 45nm nodes

Steven Wu, Sho-Shen Lee, Chun-Chi Yu, Benjamin Lin, Cheng Bai Xu, Yasuhiro Suzuki, Stewart Robertson, Tsutomu Tanaka, I-Yuan Wan

Proceedings Volume 6153, 615334 (2006) https://doi.org/10.1117/12.656640

KEYWORDS: Polymers, Thin film coatings, Lithography, Photoresist processing, Line edge roughness, Metals, Photomasks, Diffusion, Lithographic illumination, 193nm lithography

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