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Issei Masumoto
at Nippon Control System Corp
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Publications (2)
Proceedings Article | 29 September 2023 Paper
New multi-beam mask data preparation method for EUV high volume data
Kyungsup Shin, Sunyoung Kim, Jihyeon Choi, Eokbong Kim, Sanghee Lee, Harald Hoeller-Lugmayr, Amir Moqanaki, Annette Schnettelker, Mathias Tomandl, Christof Zillner, Yohei Torigoe, Taigo Fujii, Ryunosuke Miyake, Mizuki Odaka, Issei Masumoto, Masakazu Hamaji
Proceedings Volume 12915, 129150D (2023) https://doi.org/10.1117/12.2683168
KEYWORDS: Extreme ultraviolet, Design and modelling, Electronic design automation, Algorithm development, Mathematical optimization, Data conversion, Product engineering, Optical proximity correction, Nanofabrication, Lithography
Proceedings Article | 14 November 2007 Paper
Full-chip-based subresolution assist features correction for mask manufacturing
Ju-Mi Bang, Issei Masumoto, Min-Kyu Ji, Sung-Hoon Jang, Isao Aburatani, Ji-Hyun Choi, Sang-Gyun Woo, Han-Ku Cho
Proceedings Volume 6730, 67302F (2007) https://doi.org/10.1117/12.746349
KEYWORDS: SRAF, Photomasks, Critical dimension metrology, Manufacturing, Printing, Lithography, Inspection, Mask making, Control systems, Semiconductors
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