The use of self-assembled block copolymer structures to direct the formation of large area nanoscale features could
provide a silicon-based fabrication-compatible means to supplement conventional lithographic techniques. Here, self-assembled
monolayers of polystyrene-b-poly(2-vinylpyridine) (PS-b-P2VP) diblock copolymer were utilized as
structural elements for the production of pseudo-hexagonal close packed metallic nanoarrays. Metal ion loading of the
P2VP block with simple aqueous solutions of anionic metal complexes is accomplished via protonation of this basic
block, rendering it cationic; electrostatic attraction leads to a high local concentration of metal complexes within the
protonated P2VP domain. The ordering of the copolymer micelles can be enhanced by solvent vapor annealing. The
resulting templated large area metallic nanoclusters can serve as periodic seeds to grow nanofibrous thin films, which
inherit the periodicity of the underlying seeds, by glancing angle deposition (GLAD). GLAD offers a high level of
control over the composition and porosity of thin films microstructures, and has been used to make uniform and highly
porous thin film architectures for applications such as photonic crystals.
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