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Joshua Jeong
at ChangXin Memory Technologies Inc
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Publications (1)
Proceedings Article | 21 November 2023 Poster + Paper
Quantitative study of local MEEF of 2D mask corrected by inverse lithography technology
Futian Wang, Song Sun, Chunlong Yu, Yu Mu, Juan Wei, Xiaonan Liu, Cuixiang Wang, Liang Li, Qingchen Cao, Miao Jiang, Peng Xu, Joshua Jeong, Yilei Zeng, Andy Lan, Jiangliu Shi
Proceedings Volume 12751, 1275117 (2023) https://doi.org/10.1117/12.2686740
KEYWORDS: Optical proximity correction, Lithography, Semiconducting wafers, Resolution enhancement technologies, Logic, Electron beam lithography, Vestigial sideband modulation, Photomask technology, Manufacturing
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