Dr. Madhura Nataraju Profile

Dr. Madhura Nataraju

Graduate Research Assistant at Univ of Wisconsin-Madison

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Author

Publications (11)

Proceedings Article | 2 May 2008 Paper

Status of EUVL reticle chucking

Roxann Engelstad, Jaewoong Sohn, Jacob Zeuske, Venkata Siva Battula, Pradeep Vukkadala, Chris Van Peski, Kevin Orvek, Kevin Turner, Andrew Mikkelson, Madhura Nataraju

Proceedings Volume 6792, 67920X (2008) https://doi.org/10.1117/12.798937

KEYWORDS: Extreme ultraviolet lithography, Interferometry, Photomasks, Reticles, Data modeling, 3D modeling, Mathematical modeling, Photography, Image quality, Control systems

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Proceedings Article | 30 October 2007 Paper

Measuring and characterizing the nonflatness of EUVL reticles and electrostatic chucks

Roxann Engelstad, Kevin Turner, Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Venkata Siva Battula, Pradeep Vukkadala, Jacob Zeuske, Chris Van Peski

Proceedings Volume 6730, 673014 (2007) https://doi.org/10.1117/12.746842

KEYWORDS: Extreme ultraviolet lithography, Reticles, Photomasks, Interferometry, 3D modeling, Standards development, Kinematics, Semiconductors, Lithographic illumination, Mechanics

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Proceedings Article | 24 October 2007 Paper

Compensating for image placement errors induced during the fabrication and chucking of EUVL masks

Roxann Engelstad, Jaewoong Sohn, Andrew Mikkelson, Madhura Nataraju, Kevin Turner

Proceedings Volume 6730, 673004 (2007) https://doi.org/10.1117/12.752601

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Distortion, Electron beam lithography, 3D modeling, Etching, Interferometry, Surface finishing, Thin films

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Proceedings Article | 3 May 2007 Paper

Predicting and correcting for image placement errors during the fabrication of EUVL masks

R. Engelstad, J. Sohn, A. Mikkelson, M. Nataraju, K. Turner

Proceedings Volume 6533, 653314 (2007) https://doi.org/10.1117/12.737181

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Distortion, Reticles, 3D modeling, Etching, Electron beam lithography, Surface finishing, Thin films, Multilayers

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Proceedings Article | 15 March 2007 Paper

Electrostatic chucking of EUVL reticles

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Roxann Engelstad, Kevin Turner, Chris Van Peski, Kevin Orvek

Proceedings Volume 6517, 65170Y (2007) https://doi.org/10.1117/12.720621

KEYWORDS: Reticles, Extreme ultraviolet lithography, Standards development, Photomasks, Interferometers, Photography, Dielectrics, Finite element methods, Coating, Interferometry

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Proceedings Article | 20 October 2006 Paper

Experimental verification of finite element model prediction of EUVL mask flatness during electrostatic chucking

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Kevin Turner, Roxann Engelstad, Chris Van Peski

Proceedings Volume 6349, 634939 (2006) https://doi.org/10.1117/12.686153

KEYWORDS: Reticles, Data modeling, Photomasks, Extreme ultraviolet lithography, Interferometers, Standards development, Finite element methods, Photography, Vibration isolation, Particles

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Proceedings Article | 21 June 2006 Paper

Characterizing the response of an EUV reticle during electrostatic chucking

Roxann Engelstad, Edward Lovell, Andrew Mikkelson, Madhura Nataraju, Vasu Ramaswamy, Jaewoong Sohn, Gerald Dicks, Amr Abdo, Richard Tejeda

Proceedings Volume 6281, 628107 (2006) https://doi.org/10.1117/12.692727

KEYWORDS: Reticles, Particles, Extreme ultraviolet lithography, Photomasks, Extreme ultraviolet, Data modeling, Zerodur, Glasses, 3D modeling, Thermal modeling

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Proceedings Article | 22 March 2006 Paper

EUV mask and chuck analysis: simulation and experimentation

Madhura Nataraju, Jaewoong Sohn, Andrew Mikkelson, Kevin Turner, Roxann Engelstad, Chris Van Peski

Proceedings Volume 6151, 61510C (2006) https://doi.org/10.1117/12.657154

KEYWORDS: Photomasks, Extreme ultraviolet, Data modeling, Focus stacking software, Lithography, Semiconductors, Extreme ultraviolet lithography, Standards development, Interferometers, Contamination

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Proceedings Article | 8 November 2005 Paper

Electrostatic chucking and EUVL mask flatness analysis

M. Nataraju, A. Mikkelson, J. Sohn, R. Engelstad, E. Lovell

Proceedings Volume 5992, 59923S (2005) https://doi.org/10.1117/12.631361

KEYWORDS: Photomasks, Extreme ultraviolet lithography, Reticles, Data modeling, Standards development, Image quality, Control systems, Error analysis, Analytical research, Lithography

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Proceedings Article | 20 May 2004 Paper

Modeling LEEPL mask fabrication processes

Xabier Azkorra, Andrew Mikkelson, Roxann Engelstad, Edward Lovell, Jaehyuk Chang, Jaewoong Sohn, Madhura Nataraju, Hideyuki Eguchi

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.546927

KEYWORDS: Photomasks, Charged-particle lithography, Semiconducting wafers, Electrodes, Mask making, Silicon, 3D modeling, Printing, Lithography, Device simulation

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Proceedings Article | 1 August 2003 Paper

Madhura Nataraju, Timothy Johnson, Douglas Adams

Proceedings Volume 5049, (2003) https://doi.org/10.1117/12.484028

KEYWORDS: Complex systems, Data modeling, Stochastic processes, Structural health monitoring, Diagnostics, Systems modeling, Environmental sensing, Aerodynamics, Nonlinear dynamics, Failure analysis

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Environmental and operational variability due to changes in the excitation or any other variable can mimic or altogether obscure evidence of structural defects in measured data leading to false positive/negative diagnoses of damage and conservative/tolerant predictions of remaining useful life in structural health monitoring system. Diagnostic and prognostic errors like these in many types of commercial and defense-related applications must be eliminated if health monitoring is to be widely implemented in these applications. A theoretical framework of "dynamic similiarity" in which two sets of mathematical operators are utilized in one system/data model to distinguish damage from nonlinear, time-varying and stochastic events in the measured data is discussed in this paper. Because structural damage initiation, evolution and accumulation are nonlinear processes, the challenge here is to distinguish damage from nonlinear, time-varying and stochastic events in the measured data is discussed in this paper. Because structural damage initiation, evolution and accumulation are nonlinear processes, the challenge here is to distinguish abnormal from normal nonlinear dynamics, which are accentuated by physically or statistically non-stationary events in the operating environment. After discussing several examples of structural diagnosis and prognosis involving dynamic similarity, a simplifeid numerical finite element model of a helicopter blade with time-varying flexural stiffness on a nonlinear aerodynamic elastic foundation that is subjected to a stochastic base excitation is utilized to introduce and examine the effects of dynamic similarity on health monitoring systems. It is shown that environmental variability can be distinguished from structural damage using a physics-based model in conjunction with the dynamic similarity operators to develop more robust damage detection algorithms, which may prove to be more accurate and precise when operating conditions fluctuate.

Showing 5 of 11 publications

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