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Mark A. Cordier
at Zygo Corporation
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Author
Publications (1)
Proceedings Article | 17 April 2014 Paper
Projection optics for EUVL micro-field exposure tools with 0.5 NA
Holger Glatzel, Dominic Ashworth, Dan Bajuk, Matt Bjork, Mark Bremer, Mark Cordier, Kevin Cummings, Luc Girard, Michael Goldstein, Eric Gullikson, Samuel Hardy, Russ Hudyma, James Kennon, Robert Kestner, Lou Marchetti, Keyvan Nouri, Patrick Naulleau, Daniel Pierce, Regina Soufli, Eberhard Spiller, Yogesh Verma
Proceedings Volume 9048, 90481K (2014) https://doi.org/10.1117/12.2048643
KEYWORDS: Mirrors, Metrology, Wavefronts, Projection systems, Aspheric lenses, Extreme ultraviolet, Extreme ultraviolet lithography, Optical coatings, Lithography, Optical fabrication
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