Next generation lithography is likely to deploy extreme UV (EUV) light at 13.5 nm wavelength for key manufacturing processes. Currently, all promising EUV light source concepts require efficient light collection optics in order to deliver sufficeintly high light power for profitable chip production. With densely nested Wolter-Type 1 reflective optics we designed, and fabricated such optics. In this paper we report on the latest achievements in design, development and on our first at wavelength testing results of such collection optics.
Wilhelm Egle, Wolfgang Hafner, Axel Matthes, Eral Erzin, Bernhard Gaenswein, Herbert Schwarz, Piotr Marczuk, Martin Antoni, Wolfgang Singer, Frank Melzer, Joachim Hainz
EUV sources are designed to emit radiation around 13.5 nm wavelength into a solid angle of up to 2π sr. With a suitable Wolter type 1 grazing incidence optic such EUV photons can be collected with high efficiency and focussed onto a preferred target. Such Wolter type 1 collectors are characterized by densely nested concentric and confocal mirror shells with fixed distance from the source and the intermediate image.
In this paper we will report on optical and mechanical design, development, fabrication and testing of nested Wolter type 1 collectors, capable of collecting and imaging EUV photons at 13.5 nm wavelength with high efficiency.
Access to the requested content is limited to institutions that have purchased or subscribe to SPIE eBooks.
You are receiving this notice because your organization may not have SPIE eBooks access.*
*Shibboleth/Open Athens users─please
sign in
to access your institution's subscriptions.
To obtain this item, you may purchase the complete book in print or electronic format on
SPIE.org.
INSTITUTIONAL Select your institution to access the SPIE Digital Library.
PERSONAL Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.