Mr. Raghu Chalasani Profile

Raghu Chalasani

at Siemens EDA

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Publications (1)

Proceedings Article | 5 April 2011 Paper

EUV flare and proximity modeling and model-based correction

Christian Zuniga, Mohamed Habib, James Word, Gian Lorusso, Eric Hendrickx, Burak Baylav, Raghu Chalasani, Michael Lam

Proceedings Volume 7969, 79690T (2011) https://doi.org/10.1117/12.879488

KEYWORDS: Extreme ultraviolet, Optical proximity correction, Data modeling, Model-based design, Photomasks, Point spread functions, Calibration, Extreme ultraviolet lithography, Fractal analysis, 3D modeling

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