CONFERENCE PROCEEDINGS
Advanced Search
Ryosuke Ueba
at SAMSUNG Electronics Co Ltd
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 12 November 2024 Presentation + Paper
Requirements and strategies of High-NA EUV mask using MBMW
Yoonjung Cho, Inhwan Noh, Jongmun Park, Byungsup Ahn, Hongsu Kim, Minji Kim, Yuri Kim, Ueba Ryosuke, Changyoung Jeong, Jin Choi, Sang-Hee Lee
Proceedings Volume 13216, 132160E (2024) https://doi.org/10.1117/12.3034574
KEYWORDS: Extreme ultraviolet, Photomasks, Lithography, Optical lithography, Extreme ultraviolet lithography, Line edge roughness, Electron beam lithography, 3D mask effects
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top