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Tomomi Funayoshi
at Canon Inc.
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Author
Publications (1)
Proceedings Article | 9 April 2024 Poster + Paper
Open/short-TEG evaluation of 24nm-half-pitch-W damascene interconnects based on nanoimprint lithography
Kenta Suzuki, Tetsuya Ueda, Hiroshi Hiroshima, Yoshihiro Hayashi, Masaki Ishida, Tomomi Funayoshi, Hiromi Hiura, Noriyasu Hasegawa, Kiyohito Yamamoto
Proceedings Volume 12956, 129560W (2024) https://doi.org/10.1117/12.3008538
KEYWORDS: Nanoimprint lithography, Capacitors, Semiconducting wafers, Optical lithography, Fabrication, Image processing, Scanning electron microscopy, Chemical mechanical planarization, Back end of line, Tungsten
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