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Dr. Vadim V. Manuylov
RETIRED
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Profile Summary
Ph.D. in Physics and Mathematics 1991.
Since 1987 was working on modeling and simulation software for X-ray, e-beam, and optical lithography
in Russia:
R&D INSTITUTE for PHYSICAL PROBLEMS
INSTITUTE of PHYSICS and TECHNOLOGY (IPT) of RUSSIAN ACADEMY of SCIENCE
and in USA:
SILVACO
BINDKEY
SAGANTEC
LUMINESCENT
GLOBALFOUNDRIES
CADENCE
MENTOR GRAPHICS
BRION (ASML)
now retired
Publications (5)
Proceedings Article | 16 March 2009 Paper
Advanced model and fast algorithm for aerial image computation with well controlled accuracy
Proceedings Volume 7274, 727431 (2009) https://doi.org/10.1117/12.813574
KEYWORDS: Fiber optic illuminators, Computer simulations, Convolution, Transparency, Photomasks, Fourier transforms, Systems modeling, Device simulation, Numerical integration, Algorithm development
Proceedings Article | 21 March 2007 Paper
Multidimensional physical design optimization for systematic and parametric yield loss reduction
L. Karklin, A. Arkhipov, Y. Belenky, C. Decoin, D. Lay, V. Manuylov, C. Zelnik, B. Watson, J. Willekens
Proceedings Volume 6521, 65210Q (2007) https://doi.org/10.1117/12.711774
KEYWORDS: Silicon, Optical proximity correction, Design for manufacturing, Lithography, Manufacturing, Design for manufacturability, Process modeling, Photomasks, Computer simulations, Device simulation
Proceedings Article | 16 July 2002 Paper
Monte Carlo simulation of SEM for target with complex geometry
Proceedings Volume 4689, (2002) https://doi.org/10.1117/12.473529
KEYWORDS: Electrons, Monte Carlo methods, Scanning electron microscopy, Optical simulations, Scattering, Chemical elements, Computer simulations, Laser scattering, Beam shaping, Backscatter
Proceedings Article | 14 September 2001 Paper
Simulation of exposure process in complex nonplanar 2D/3D resist-substrate structures
Vadim Manuylov, Misha Temkin
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435692
KEYWORDS: Refractive index, Interfaces, Reflection, Radio propagation, Beam propagation method, Lithography, Wave propagation, Computer simulations, Chemical elements, Ultraviolet radiation
Proceedings Article | 5 June 1998 Paper
Extension of the traditional optical model for investigation into EUV projection lithography capabilities
Vladimir Ivin, Kevin Lucas, Tariel Makhviladze, Vadim Manuylov, Marina Medvedeva
Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309628
KEYWORDS: Extreme ultraviolet, Objectives, Photomasks, EUV optics, Projection systems, Mirrors, Projection lithography, Reflectivity, Optical lithography, Printing
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