Wei-Hsien Hsieh
at Nanya Technology Corp
SPIE Involvement:
Author
Publications (4)

Proceedings Article | 28 March 2012 Paper
Dennis Shu-Hao Hsu, Wei-Hsien Hsieh, Chun-Yen Huang, Wen-Bin Wu, Chiang-Lin Shih
Proceedings Volume 8325, 83251M (2012) https://doi.org/10.1117/12.916602
KEYWORDS: Line width roughness, Polymers, Photoresist materials, Diffusion, Statistical analysis, Electroluminescence, Diffractive optical elements, Immersion lithography, Lithographic illumination, Lithography

Proceedings Article | 16 April 2011 Paper
Dennis Shu-Hao Hsu, Walter Wang, Wei-Hsien Hsieh, Chun-Yen Huang, Wen-Bin Wu, Chiang-Lin Shih, Steven Shih
Proceedings Volume 7972, 79720D (2011) https://doi.org/10.1117/12.879374
KEYWORDS: Image processing, Double patterning technology, Optical lithography, Etching, Lithography, Manufacturing, Coating, Extreme ultraviolet, Materials processing, Overlay metrology

Proceedings Article | 27 March 2007 Paper
Hung Jen Liu, Wei Hsien Hsieh, Chang Ho Yeh, Jan Shiun Wu, Hung Wei Chan, Wen Bin Wu, Feng Yi Chen, Tse Yao Huang, Chiang Lin Shih, Jeng Ping Lin
Proceedings Volume 6520, 65202J (2007) https://doi.org/10.1117/12.711855
KEYWORDS: Double patterning technology, Photomasks, Lithography, Etching, Photoresist processing, Reflectivity, Reactive ion etching, Silicon, Photoresist materials, Neodymium

Proceedings Article | 21 March 2007 Paper
Wei Hsien Hsieh, Hung Jen Liu, Wen Bin Wu, Chiang Lin Shin, Jeng Ping Lin
Proceedings Volume 6519, 65193E (2007) https://doi.org/10.1117/12.711944
KEYWORDS: Resolution enhancement technologies, Optical lithography, Photomasks, Lithography, Chemical reactions, Semiconductors, Polymers, Optical design, Optical proximity correction, Coating

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