Mr. Wesley Zanders Profile

Wesley Zanders

at SCREEN SPE Germany GmbH

SPIE Involvement:

Author

Publications (11)

Proceedings Article | 13 November 2024 Presentation

Enhancing sustainability in semiconductor manufacturing: energy-efficient optical crosslinking for lithography processes

Elke Caron, Wesley Zanders, Seungjoo Baek, Seonggil Heo, Jelle Vandereyken, Hyo Seon Suh, Douglas Guerrero, Andreia Santos, Masahiko Harumoto, Tsuyoshi Mitsuhashi

Proceedings Volume PC13215, PC1321507 (2024) https://doi.org/10.1117/12.3036987

KEYWORDS: Lithography, Sustainability, Semiconductor manufacturing, Optics manufacturing, Spin on carbon materials, Semiconductors, Power consumption, Industry, Carbon, System integration

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Proceedings Article | 10 April 2024 Presentation + Paper

Machine, process, and material efforts towards sustainable lithography

Andreia Santos, Wesley Zanders, Elke Caron, Seungjoo Baek, Seonggil Heo, Jelle Vandereyken, Hyo Seon Suh, Douglas Guerrero, Masahiko Harumoto, Tsuyoshi Mitsuashi

Proceedings Volume 12957, 1295717 (2024) https://doi.org/10.1117/12.3010506

KEYWORDS: Spin on carbon materials, Sustainability, Thermography, Power consumption, Lithography, Displays, Semiconductors, Optical lithography, Materials processing, Extreme ultraviolet

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Proceedings Article | 9 April 2024 Poster + Paper

Enhancing process stability and defect control in advanced EUV lithography via innovative track systems

Elke Caron, Andreia Santos, Wesley Zanders, Jelle Vandereyken, Seonggil Heo, Masahiko Harumoto

Proceedings Volume 12957, 1295720 (2024) https://doi.org/10.1117/12.3011129

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Line width roughness, Image processing, Standards development, Line edge roughness, Film thickness, Optical lithography, Metal oxides, Critical dimension metrology

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Proceedings Article | 9 April 2024 Presentation + Paper

Mitigation of EUV photoresist pattern deformation by wafer backside cleaning techniques

Masahiko Harumoto, Andreia Figueiredo dos Santos, Wesley Zanders, Elke Caron, Jelle Vandereyken

Proceedings Volume 12957, 129570Z (2024) https://doi.org/10.1117/12.3010976

KEYWORDS: Semiconducting wafers, Particles, Scanning electron microscopy, Extreme ultraviolet lithography, Scanners, Photoresist materials, Displays, Deformation

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Proceedings Article | 1 December 2023 Presentation + Paper

Track integrated backside cleaning towards high-NA EUV: correlation of backside contamination with frontside patterning performance

Jelle Vandereyken, Vincent Truffert, Sandip Halder, Elke Caron, Wesley Zanders, Andreia Santos, Masahiko Harumoto

Proceedings Volume PC12750, PC127500Q (2023) https://doi.org/10.1117/12.2687017

KEYWORDS: Semiconducting wafers, Contamination, Scanners, Optical lithography, Particles, Extreme ultraviolet, Displays, Extreme ultraviolet lithography, Inspection, Critical dimension metrology

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Proceedings Article | 22 November 2023 Poster

Showcasing EUV process stability and defect control on SCREEN’s DT-3000 track

Elke Caron, Andreia Santos, Wesley Zanders, Jelle Vandereyken, Seonggil Heo, Masahiko Harumoto

Proceedings Volume PC12750, PC127500V (2023) https://doi.org/10.1117/12.2687628

KEYWORDS: Extreme ultraviolet, Semiconductor manufacturing, Line width roughness, Extreme ultraviolet lithography, Critical dimension metrology, Semiconductors, Semiconducting wafers, Printing, Optical lithography, Metrology

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Proceedings Article | 22 November 2023 Poster

Track solutions for enhanced resist stability: a leap towards high-NA EUVL manufacturability

Andreia Santos, Elke Caron, Wesley Zanders, Seonggil Heo, Jelle Vandereyken, Masahiko Harumoto

Proceedings Volume PC12750, PC127500U (2023) https://doi.org/10.1117/12.2687522

KEYWORDS: Extreme ultraviolet lithography, Manufacturing, Photoresist developing, Metal oxides, Semiconductors, Semiconductor manufacturing, Scanners, Printing, Photoresist materials, Optical lithography

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Proceedings Article | 29 May 2023 Presentation + Paper

Track integrated backside cleaning solution: impact of backside contamination on printing distortions

Andreia Santos, Wesley Zanders, Elke Caron, Masahiko Harumoto, Jelle Vandereyken, Jan Hermans, Vincent Truffert, Sandip Halder, Ronald Otten, Leon van Dijk, Richard van Haren

Proceedings Volume 12498, 1249809 (2023) https://doi.org/10.1117/12.2658418

KEYWORDS: Semiconducting wafers, Particles, Contamination, Extreme ultraviolet lithography, Scanners, Displays, Extreme ultraviolet, Printing, Industry, Optical lithography

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Proceedings Article | 30 April 2023 Poster

Track hardware as an EUV lithography booster: a deep-dive into SCREEN’s DT-3000 platform capabilities

Andreia Santos, Wesley Zanders, Elke Caron, Yuji Tanaka, Masaya Asai, Masahiko Harumoto, Jelle Vandereyken, Lander Verstraete, Hyo Seon Suh

Proceedings Volume 12498, 1249823 (2023) https://doi.org/10.1117/12.2658398

KEYWORDS: Extreme ultraviolet lithography, Lithography, Line width roughness, Ecosystems

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Proceedings Article | 31 October 2022 Poster

SCREEN's DT-3000 track-booster system: how can hardware improve EUV performance?

Andreia Santos, Yuji Tanaka, Masaya Asai, Masahiko Harumoto, Wesley Zanders, Jelle Vandereyken, Lander Verstraete, Ashish Rathore, Hyo Seon Suh

Proceedings Volume PC12292, PC122920W (2022) https://doi.org/10.1117/12.2643150

KEYWORDS: Extreme ultraviolet, Lithography, Line width roughness, Extreme ultraviolet lithography, Semiconducting wafers, Optical lithography, Ecosystems

Proceedings Article | 26 May 2022 Paper

Orthogonal array pillar process development for high density 4F2 memory cells at 40nm pitch and beyond

Murat Pak, Wesley Zanders, Patrick Wong, Sandip Halder, Romuald Blanc, Laurent Souriau, Jeonghoon Lee, Gouri Sankar Kar

Proceedings Volume 12051, 120510J (2022) https://doi.org/10.1117/12.2618761

KEYWORDS: Semiconducting wafers, Photoresist materials, Array processing, Extreme ultraviolet lithography, Optical lithography, Finite element methods, Etching, Electroluminescence, Critical dimension metrology, Scanning electron microscopy

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Showing 5 of 11 publications

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