A scalable nanofabrication technique for chiral metamaterials is presented, which combines the dynamic shadowing growth and self-assembled nanosphere monolayers, and is also known as nanosphere shadowing lithography. We have developed two strategies based on nanosphere shadowing lithography to prepare chiral nanostructures. The first strategy is to create a quasi-three-dimensional single-layer fan-shaped chiral nanostructure on nanospheres with one plasmonic material. The second strategy is to create three-dimensional multi-layers helical nanostructures with one plasmonic material and one dielectric material. Both strategies can produce large-area chiral nanostructures with strong chiral optical response, which makes nanosphere shadowing lithography suitable for producing chiral metamaterial based devices such as an ultrathin narrow-band circular polarizer.
The fabrication and optimization of plasmonic nanostructures have many interesting and important applications including advancements in surface-enhanced Raman spectroscopy (SERS). One popular and cost-effective method to fabricate plasmonic nanopatterns is by a colloid template. By combining close-packed colloid monolayer and dynamic shadowing growth, we demonstrate that a variety of nanopatterns, such as nano-triangles, nano-cup triangles, hexagonal holes, and dual triangles, can be fabricated by varying vapor deposition angle, the substrate azimuthal rotation, as well as the evaporation configuration. Especially when a two-source evaporator is used, dual triangles with different shapes and compositions are simultaneously formed. The formation of these nanopatterns can be predicted by numerical and Monte Carlo simulations. In addition, the visible localized surface plasmon resonance (LSPR) of these patterns can be tuned systematically by changing the deposition conditions and the colloidal monolayer. Their plasmonic properties can be understood through finite-difference time-domain simulations. The tunability of LSPR can be used to design optimized substrate for SERS.
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