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Dr. Joseph Sebastian
at Hitachi High-Tech America Inc
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Author
Publications (1)
Proceedings Article | 1 May 2023 Presentation + Paper
Evaluation of TiN hardmask films to prevent line wiggling due to plasma-induced film stress
A. Turnquist, N. Kofuji, J. Sebastian, Z. Liu, H. Kou, H. Fukuda, Y. Tomczak, Y. Sun, D. Piumi, D. Roest
Proceedings Volume 12499, 1249904 (2023) https://doi.org/10.1117/12.2661307
KEYWORDS: Tin, Coating stress, Etching, Plasma, Plasma etching, Surface roughness, Scanning electron microscopy, Film thickness, Line edge roughness, Deformation
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