157-NM LITHOGRAPHY

Marathon evaluation of optical materials for 157-nm lithography

[+] Author Affiliations
Vladimir Liberman, Mordechai Rothschild, Nikolay N. Efremow, Steven T. Palmacci, Jan H. C. Sedlacek

Massachusetts Institute of Technology, Lincoln Laboratory, Lexington, Massachusetts?02420

Andrew Grenville

Intel/SEMATECH, Austin, Texas 78741

Kevin Orvek

Components Research/Intel, Hudson, Massachusetts 01749

J. Micro/Nanolith. MEMS MOEMS. 2(1), 19-26 (Jan 01, 2003). doi:10.1117/1.1528948
History: Received Jul. 3, 2002; Revised Oct. 4, 2002; Accepted Oct. 8, 2002; Online January 09, 2003
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We present the methodology and recent results on the long-term evaluation of optical materials for 157-nm lithographic applications. We review the unique metrology capabilities that have been developed for accurately assessing optical properties of samples both online and offline, utilizing VUV spectrophotometry with in situ lamp-based cleaning. We describe ultraclean marathon testing chambers that have been designed to decouple effects of intrinsic material degradation from extrinsic ambient effects. We review our experience with lithography-grade 157-nm lasers and detector durability. We review the current status of bulk materials for lenses, such as CaF2 and BaF2, and durability results of antireflectance coatings. Finally, we discuss the current state of laser durability of organic pellicles. © 2003 Society of Photo-Optical Instrumentation Engineers.

© 2003 Society of Photo-Optical Instrumentation Engineers

Citation

Vladimir Liberman ; Mordechai Rothschild ; Nikolay N. Efremow ; Steven T. Palmacci ; Jan H. C. Sedlacek, et al.
"Marathon evaluation of optical materials for 157-nm lithography", J. Micro/Nanolith. MEMS MOEMS. 2(1), 19-26 (Jan 01, 2003). ; http://dx.doi.org/10.1117/1.1528948


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