Articles

Characterization of 193-nm resist layers by critical dimension-scanning electron microscopy sidewall imaging

[+] Author Affiliations
Thomas Marschner

Infineon Technologies, Unit Process Development Department, Koenigsbruecker Street 180, 01099 Dresden, Germany E-mail: thomas.marschner@infineon.com

Christian Stief

Applied Materials GmbH, AME Technology, Buchenstreet 16b, 01097 Dresden, Germany

J. Micro/Nanolith. MEMS MOEMS. 4(1), 013007 (Feb. 4, 2005). doi:10.1117/1.1857534
History: Received Sep. 5, 2003; Revised Jun. 3, 2004; Accepted Aug. 17, 2004; Feb. 4, 2005; Online February 04, 2005
Text Size: A A A

In this work, the profile reconstruction capability of the Applied Materials NanoSEM 3-D critical dimension-scanning electron microscopy is evaluated. The system allows the fully automatic reconstruction of profiles by evaluating profiles measured at two different beam tilt angles. From two different tilt angles up to 15 deg, the reconstruction of sidewall profiles is possible in a quick and nondestructive way, even for negatively sloped profiles. The sensitivity of profile reconstruction, especially with respect to height and undercut detection in dependence of structure height and beam tilt angle, is discussed. We investigate precision and accuracy of profile reconstruction by comparing results from profile reconstruction to AFM and cross-sectional (X-SEM) results. We show that the sidewall angle can accurately be detected for 193-nm resist structures even for negatively sloped profiles. This enables the system for production use especially for monitoring of such profiles. As the profile reconstruction is done with nearly the same speed as regular top-down measurements, a clear advantage over existing monitoring techniques is obvious. © 2005 Society of Photo-Optical Instrumentation Engineers.

© 2005 Society of Photo-Optical Instrumentation Engineers

Citation

Thomas Marschner and Christian Stief
"Characterization of 193-nm resist layers by critical dimension-scanning electron microscopy sidewall imaging", J. Micro/Nanolith. MEMS MOEMS. 4(1), 013007 (Feb. 4, 2005). ; http://dx.doi.org/10.1117/1.1857534


Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Journal Articles

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.