SPECIAL SECTION ON MOEMS Microlithography and Processing

MOEMS-based lithography for the fabrication of micro-optical components

[+] Author Affiliations
Lars Erdmann, Arnaud Deparnay, Gunter Maschke, Mario Längle, Robert Brunner

Carl Zeiss Jena GmbH , Research and Technology Division, Carl Zeiss Promenade 10, 07745 Jena, Germany

J. Micro/Nanolith. MEMS MOEMS. 4(4), 041601 (November 07, 2005). doi:10.1117/1.2114647
History: Received December 01, 2004; Revised June 02, 2005; Accepted August 08, 2005; Published November 07, 2005
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We present a new method for the fabrication of diffractive and refractive micro-optical components. The method is suitable for high-quality rapid prototyping of optical components and allows the fast experimental test of designs for computer-generated holograms or refractive microstructures. Our method is based on employing a digital-multimirror device (DMD) as a switchable projection mask. The DMD is imaged into a photoresist layer using a Carl Zeiss lithography objective with a demagnification of 10:1 and a numerical aperture of 0.32 on the image side. The resulting pixel size is 1.368×1.368μm. In comparison with laser direct writing with a single spot, our method is a parallel processing of nearly 800,000 pixels (1024×768pixels). This fabrication method can be applied to all MOEMS components. The method adds a new dimension in MOEMS processing, reducing the fabrication complexity, and improves the flexibility of process simulation and design.

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© 2005 Society of Photo-Optical Instrumentation Engineers

Citation

Lars Erdmann ; Arnaud Deparnay ; Gunter Maschke ; Mario Längle and Robert Brunner
"MOEMS-based lithography for the fabrication of micro-optical components", J. Micro/Nanolith. MEMS MOEMS. 4(4), 041601 (November 07, 2005). ; http://dx.doi.org/10.1117/1.2114647


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