Special Section on Computational Lithography

Highly parallel rigorous simulations of phase-shift masks with a generalized eigen-oscillation spectral element method

[+] Author Affiliations
Ke Zong

Fudan University, State Key Lab of ASIC & System, Microelectronics Department, Shanghai 201203, China

Xuan Zeng

Fudan University, State Key Lab of ASIC & System, Microelectronics Department, Shanghai 201203, China

Xia Ji

Chinese Academy of Sciences, Institute of Computational Mathematics, Beijing 100190, China

Wei Cai

University of North Carolina at Charlotte, Department of Mathematics and Statistics, Charlotte, North Carolina 28223

J. Micro/Nanolith. MEMS MOEMS. 8(3), 031403 (July 02, 2009). doi:10.1117/1.3158611
History: Received October 28, 2008; Revised February 23, 2009; Accepted April 01, 2009; Published July 02, 2009
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We apply a newly developed parallel generalized eigen-oscillation spectral element method (GeSEM) for rigorous simulations of 2-D phase-shift masks (PSMs). The GeSEM combines highly parallel Schwarz-domain decomposition iterations and an eigen-oscillation-based spectral method to model high-frequency oscillatory electromagnetic fields in PSMs with dispersive chrome materials in the PSMs. The performance of the GeSEM has been compared to the popular plane wave-based waveguide method for 2-D masks. The numerical results have clearly demonstrated the GeSEM’s advantages in modeling the effects of nonperiodic structures such as optical images near mask edges, and its speedup through parallel implementations, which makes the simulation of a large-scale mask possible in whole-chip mask modeling.

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© 2009 Society of Photo-Optical Instrumentation Engineers

Citation

Ke Zong ; Xuan Zeng ; Xia Ji and Wei Cai
"Highly parallel rigorous simulations of phase-shift masks with a generalized eigen-oscillation spectral element method", J. Micro/Nanolith. MEMS MOEMS. 8(3), 031403 (July 02, 2009). ; http://dx.doi.org/10.1117/1.3158611


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