Special Section on Metrology

Electrical validation of through-process optical proximity correction verification limits

[+] Author Affiliations
Omprakash Jaiswal, Rakesh Kuncha, Taksh Bharat, Vipin Madangarli

IBM India Pvt. Ltd., System and Technology Group, Manyata Embassy Park, D3 First Floor Nagavara, Bangalore 560045, India

Edward Conrad, James Bruce

IBM Systems and Technology Group, 1000 River Road, Essex Junction, Vermont 05452

Sajan Marokkey

Infineon Technologies AG, 2070 Route 52, Hopewell Junction, New York 12533

J. Micro/Nanolith. MEMS MOEMS. 9(4), 041303 (December 16, 2010). doi:10.1117/1.3514703
History: Received March 30, 2010; Revised August 09, 2010; Accepted September 21, 2010; Published December 16, 2010; Online December 16, 2010
Text Size: A A A

Electrical validation of through process optical proximity correction verification limits in 32-nm process technology is presented. Correlation plots comparing electrical and optical simulations are generated by weighting the probability of occurrence of each process conditions. The design of electrical layouts is extended to subdesign rules to force failure and derive better correlation between electrical and simulated outputs. Some of these subdesign rule designs amplify the failures induced by an exposure tool, such as optical aberrations. Observations in this regard are reported. Sensitivity with respect to dimensions, orientations, and wafer distribution are discussed in detail.

Figures in this Article
© 2010 Society of Photo-Optical Instrumentation Engineers

Citation

Omprakash Jaiswal ; Rakesh Kuncha ; Taksh Bharat ; Vipin Madangarli ; Edward Conrad, et al.
"Electrical validation of through-process optical proximity correction verification limits", J. Micro/Nanolith. MEMS MOEMS. 9(4), 041303 (December 16, 2010). ; http://dx.doi.org/10.1117/1.3514703


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Proceedings Articles

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.