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Special Section on Directed Self-Assembly

Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment

[+] Author Affiliations
Paulina A. Rincon Delgadillo

University of Wisconsin-Madison, Department of Chemical and Biological Engineering, 1415 Engineering Drive, Madison, Wisconsin 53706

IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

Roel Gronheid

IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

Christopher J. Thode, Paul F. Nealey

University of Wisconsin-Madison, Department of Chemical and Biological Engineering, 1415 Engineering Drive, Madison, Wisconsin 53706

Hengpeng Wu, Yi Cao, Mark Neisser

AZ Electronic Materials, 70 Meister Avenue, Branchburg, New Jersey 08876

Mark Somervell, Kathleen Nafus

Tokyo Electron America, 2400 Grove Boulevard, Austin, Texas 78741

J. Micro/Nanolith. MEMS MOEMS. 11(3), 031302 (Jul 09, 2012). doi:10.1117/1.JMM.11.3.031302
History: Received December 1, 2011; Revised March 19, 2012; Accepted April 16, 2012
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Abstract.  The implementation of our previously reported chemo-epitaxy method for directed self-assembly (DSA) of block copolymers (BCPs) on 300-mm wafers is described in detail. Some challenges to be addressed include edge bead removal control of the layers forming the exposure stack and uniformity of the deposited films across the wafer. With the fine tuning of the process conditions, this flow provides chemically nanopatterned substrates with well-defined geometry and chemistry. After a film of BCP is annealed on the chemical patterns, high degrees of perfection are achieved. A BCP with natural periodicity of 25 nm was assembled on100-nm pitch prepatterns, obtaining 4X feature multiplication. Top-down scanning electron microscope images show a wide process window with depth of focus >200nm and exposure latitude >40% for lines and spaces of 12.5-nm half-pitch. We provide a platform for future study of the origin of DSA generated defects and their relationship to process conditions and materials that are amenable to use by the semiconductor industry.

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© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Paulina A. Rincon Delgadillo ; Roel Gronheid ; Christopher J. Thode ; Hengpeng Wu ; Yi Cao, et al.
"Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment", J. Micro/Nanolith. MEMS MOEMS. 11(3), 031302 (Jul 09, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.3.031302


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