Special Section on Directed Self-Assembly

Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment

[+] Author Affiliations
Paulina A. Rincon Delgadillo

University of Wisconsin-Madison, Department of Chemical and Biological Engineering, 1415 Engineering Drive, Madison, Wisconsin 53706

IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

Roel Gronheid

IMEC, Kapeldreef 75, B-3001 Leuven, Belgium

Christopher J. Thode, Paul F. Nealey

University of Wisconsin-Madison, Department of Chemical and Biological Engineering, 1415 Engineering Drive, Madison, Wisconsin 53706

Hengpeng Wu, Yi Cao, Mark Neisser

AZ Electronic Materials, 70 Meister Avenue, Branchburg, New Jersey 08876

Mark Somervell, Kathleen Nafus

Tokyo Electron America, 2400 Grove Boulevard, Austin, Texas 78741

J. Micro/Nanolith. MEMS MOEMS. 11(3), 031302 (Jul 09, 2012). doi:10.1117/1.JMM.11.3.031302
History: Received December 1, 2011; Revised March 19, 2012; Accepted April 16, 2012
Text Size: A A A

Abstract.  The implementation of our previously reported chemo-epitaxy method for directed self-assembly (DSA) of block copolymers (BCPs) on 300-mm wafers is described in detail. Some challenges to be addressed include edge bead removal control of the layers forming the exposure stack and uniformity of the deposited films across the wafer. With the fine tuning of the process conditions, this flow provides chemically nanopatterned substrates with well-defined geometry and chemistry. After a film of BCP is annealed on the chemical patterns, high degrees of perfection are achieved. A BCP with natural periodicity of 25 nm was assembled on100-nm pitch prepatterns, obtaining 4X feature multiplication. Top-down scanning electron microscope images show a wide process window with depth of focus >200nm and exposure latitude >40% for lines and spaces of 12.5-nm half-pitch. We provide a platform for future study of the origin of DSA generated defects and their relationship to process conditions and materials that are amenable to use by the semiconductor industry.

Figures in this Article
© 2012 Society of Photo-Optical Instrumentation Engineers

Citation

Paulina A. Rincon Delgadillo ; Roel Gronheid ; Christopher J. Thode ; Hengpeng Wu ; Yi Cao, et al.
"Implementation of a chemo-epitaxy flow for directed self-assembly on 300-mm wafer processing equipment", J. Micro/Nanolith. MEMS MOEMS. 11(3), 031302 (Jul 09, 2012). ; http://dx.doi.org/10.1117/1.JMM.11.3.031302


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

PubMed Articles
Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.