Pitch variations of self-assembled cylindrical block copolymers in lithographically defined trenches

Henk Boots; Jessica M. de Ruiter; Thanh Trung Nguyen; Aurelie Brizard; Emiel Peeters; Sander F. Wuister; Tamara S. Druzhinina; Joanne  K. Wolterink; Johannes G. E. M. Fraaije

doi:10.1117/1.JMM.13.3.033015

15 September 2014 Pitch variations of self-assembled cylindrical block copolymers in lithographically defined trenches

Henk Boots, Jessica M. de Ruiter, Thanh Trung Nguyen, Aurelie Brizard, Emiel Peeters, Sander F. Wuister, Tamara S. Druzhinina, Joanne K. Wolterink, Johannes G. E. M. Fraaije

Author Affiliations +

Journal of Micro/Nanolithography, MEMS, and MOEMS, Vol. 13, Issue 3, 033015 (September 2014). https://doi.org/10.1117/1.JMM.13.3.033015

Abstract

A detailed analysis of the impact of pitch variations in block copolymer self-assembly patterns on defect density and placement errors inside lithographically defined trenches is presented. The presence of random variations in the pitch of nanopatterns resulting from the self-assembly of cylindrical phase block copolymer in open trenches (one-dimensional confinement) is experimentally demonstrated and confirmed by theoretical modeling. The simulations show that the intrinsic pitch spread is not affected when the same block copolymer is studied inside closed trenches (two-dimensional confinement) where the observed spread has a direct influence on placement and defectivity. The magnitude of the detrimental impact of the pitch variations on both defect density and placement accuracy in closed trenches is strongly dependent on trench length. These findings pose new design rules for future applications of directed self-assembly in semiconductor industry.

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Henk Boots, Jessica M. de Ruiter, Thanh Trung Nguyen, Aurelie Brizard, Emiel Peeters, Sander F. Wuister, Tamara S. Druzhinina, Joanne K. Wolterink, and Johannes G. E. M. Fraaije "Pitch variations of self-assembled cylindrical block copolymers in lithographically defined trenches," Journal of Micro/Nanolithography, MEMS, and MOEMS 13(3), 033015 (15 September 2014). https://doi.org/10.1117/1.JMM.13.3.033015

Published: 15 September 2014

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