Lithography

Contact holes patterning by directed self-assembly of block copolymers: process window study

[+] Author Affiliations
Ahmed Gharbi, Raluca Tiron, Maxime Argoud, Patricia Pimenta Barros

CEA-LETI, Minatec, 17 Rue des Martyrs, 38054 Grenoble, Cedex 9, France

Xavier Chevalier, Celia Nicolet, Christophe Navarro

Arkema France, Route Nationale 117, BP34, 64170 Lacq, France

J. Micro/Nanolith. MEMS MOEMS. 14(2), 023508 (Jun 18, 2015). doi:10.1117/1.JMM.14.2.023508
History: Received February 11, 2015; Accepted May 22, 2015
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Abstract.  Contact hole (CH) patterning by directed self-assembly (DSA) of polystyrene-b-polymethylmethacrylate (PS-b-PMMA) block copolymers (BCPs) is extensively studied. Based on statistical analysis of defectivity and CD measurements after DSA, a process window (PW) for CH shrink is experimentally determined as a function of guiding pattern dimensions and BCP molecular weights corresponding to BCP natural periods. This PW permits to define the suitable BCP molecular weight and the best guiding CD ranges required to achieve a desired DSA hole CD within a specific tolerance. As an example, for a DSA hole CD targeted at 19.5 nm with 10% tolerance, circular guiding patterns of 52 nm CD with 20% guiding CD latitude are needed using a 35-nm-natural-period cylindrical BCP. Furthermore, it is shown that the CH shrink PW is also dependent on the guiding pattern density and the DSA process conditions such as the self-assembly annealing and the spin coating conditions. The study also highlights an interesting property of commensurability between guiding pattern dimensions and BCP’s natural period that governs the DSA CH patterning for both CH shrink and CH doubling configurations. This permits one to predict the guiding pattern dimensions needed for CH patterning by DSA using a given BCP of known natural period.

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© 2015 Society of Photo-Optical Instrumentation Engineers

Citation

Ahmed Gharbi ; Raluca Tiron ; Maxime Argoud ; Xavier Chevalier ; Patricia Pimenta Barros, et al.
"Contact holes patterning by directed self-assembly of block copolymers: process window study", J. Micro/Nanolith. MEMS MOEMS. 14(2), 023508 (Jun 18, 2015). ; http://dx.doi.org/10.1117/1.JMM.14.2.023508


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