Special Section on Alternative Lithographic Technologies V

Surface affinity role in graphoepitaxy of lamellar block copolymers

[+] Author Affiliations
Guillaume Claveau, Patrick Quemere, Maxime Argoud, Jerome Hazart, Patricia Pimenta Barros, Aurelien Sarrazin, Nicolas Posseme, Raluca Tiron

CEA-LETI, MINATEC Campus, 17 Rue des Martyrs, 38054 Grenoble, France

Xavier Chevalier, Celia Nicolet, Christophe Navarro

ARKEMA FRANCE, Groupement de Recherches de Lacq, R.N. 117, BP34-64170 Lacq, France

J. Micro/Nanolith. MEMS MOEMS. 15(3), 031604 (Aug 25, 2016). doi:10.1117/1.JMM.15.3.031604
History: Received June 2, 2016; Accepted August 1, 2016
Text Size: A A A

Abstract.  Overcoming the optical limitations of 193-nm immersion lithography can be achieved using directed self-assembly (DSA) of block-copolymers (BCPs) as a low-cost and versatile complementary technique. The goal of this paper is to investigate the potential of DSA to address line and space (L/S) high-resolution patterning by performing the density multiplication of lines with the graphoepitaxy approach. As surface affinity is a key parameter in self-assembly, three variations, or “flavors,” of DSA template affinity are investigated regarding several success criteria such as morphology control or defectivity. More precisely, both the methodology to register DSA defects and the impact of process parameters on defectivity are detailed. Using the 300-mm pilot line available in LETI and Arkema’s advanced materials, we investigate process optimization of DSA line/space patterning of a 38-nm period lamellar PS-b-PMMA BCP (L38). Our integration scheme is based on BCP self-assembly inside organic hard mask guiding patterns obtained using 193i-nm lithography. Defect analysis coupled with the fine tuning of process parameters (annealing, brush material) provided the optimum conditions for the L38 self-assembly. Using such conditions, DSA using the three affinity flavors is investigated by means of SEM top-view and cross-section review. Lithographic performances of one selected flavor are then evaluated with the comparison of process windows function of either commensurability, morphology, or roughness. This work is meant as a guideline for the graphoepitaxy optimization of materials and process parameters on a 300-mm platform.

© 2016 Society of Photo-Optical Instrumentation Engineers

Citation

Guillaume Claveau ; Patrick Quemere ; Maxime Argoud ; Jerome Hazart ; Patricia Pimenta Barros, et al.
"Surface affinity role in graphoepitaxy of lamellar block copolymers", J. Micro/Nanolith. MEMS MOEMS. 15(3), 031604 (Aug 25, 2016). ; http://dx.doi.org/10.1117/1.JMM.15.3.031604


Tables

Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).

Some tools below are only available to our subscribers or users with an online account.

Related Content

Customize your page view by dragging & repositioning the boxes below.

Related Book Chapters

Topic Collections

Advertisement
  • Don't have an account?
  • Subscribe to the SPIE Digital Library
  • Create a FREE account to sign up for Digital Library content alerts and gain access to institutional subscriptions remotely.
Access This Article
Sign in or Create a personal account to Buy this article ($20 for members, $25 for non-members).
Access This Proceeding
Sign in or Create a personal account to Buy this article ($15 for members, $18 for non-members).
Access This Chapter

Access to SPIE eBooks is limited to subscribing institutions and is not available as part of a personal subscription. Print or electronic versions of individual SPIE books may be purchased via SPIE.org.