Separation of variables based method for fast calculation of imaging system in lithographic tools

Shuang Xu; Bo Tao; Yongxing Guo; Gongfa Li

doi:10.1117/12.2506071

15 November 2018 Separation of variables based method for fast calculation of imaging system in lithographic tools

Shuang Xu, Bo Tao, Yongxing Guo, Gongfa Li

Proceedings Volume 10964, Tenth International Conference on Information Optics and Photonics; 1096446 (2018) https://doi.org/10.1117/12.2506071
Event: Tenth International Conference on Information Optics and Photonics (CIOP 2018), 2018, Beijing, China

Abstract

For lithographic tools, the forward model of imaging system is repeated many times in the inverse optimization algorithm of optical proximity correction (OPC). Fast and accurate imaging simulation is highly desirable as one of the most critical components in the forward modeling simulations. We have focused on investigating the physical properties of optical imaging in lithography and introduced the method of separation of variables in Mathematical Physics as the fundamental theory to deal with a wide range of process variables. We proposed a rigorous methodology from first principles to speed up image simulations. The proposed imaging formula can be rearranged by two parts, one with only variables, while the remaining part independent with the variables. Simulations for a variety of different process variables confirmed that the proposed method yields a superior quality of image with an accuracy of 10^-3 and superior performance of speed. Therefore, the proposed method provides a novel theory and practical means for OPC and other resolution enhancement technologies (RETs) in optical lithography.

Citation Download Citation

Shuang Xu, Bo Tao, Yongxing Guo, and Gongfa Li "Separation of variables based method for fast calculation of imaging system in lithographic tools", Proc. SPIE 10964, Tenth International Conference on Information Optics and Photonics, 1096446 (15 November 2018); https://doi.org/10.1117/12.2506071

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KEYWORDS

Lithography

Imaging systems

Optical lithography

Photomasks

Optical imaging

Optical proximity correction

Algorithm development

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