Paper
23 March 2020 Block copolymers with a fluoro-block for 5 nm DSA patterning application
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Abstract
In this manuscript, various fluorine-containing BCPs were synthesized by living anionic polymerization or reversible addition−fragmentation chain-transfer (RAFT) polymerization. The resulted BCPs showed high χ value > 0.2. With similar χ value, we observed that PS-typed BCPs formed microdomains of 5 nm within 1 min at 80°C, whereas polymethacrylate-typed ones required 1 h annealing at 160°C. When rigid side chain was incorporated into the polymethacrylate block, the annealing time can be shortened to 5 min at 160°C. However, the poor film formation of the such BCP with rod-like side chain resulted in rough line pattern after the thermal annealing process. The polymethacrylate-typed BCPs generally requires high boiling point solvents for better film formation and better line patterning.
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Xuemiao Li, Zhilong Li, Le Dai, Hui Cao, and Hai Deng "Block copolymers with a fluoro-block for 5 nm DSA patterning application", Proc. SPIE 11326, Advances in Patterning Materials and Processes XXXVII, 113261E (23 March 2020); https://doi.org/10.1117/12.2543121
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KEYWORDS
Annealing

Directed self assembly

Optical lithography

Liquid crystals

Scanning electron microscopy

X-rays

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