Assessment of high-contrast G- and I-line resists using high-numerical-aperture exposure tools

Alois Gutmann; Johann Binder; Guenther Czech; Juergen Karl; Leonhard Mader; Daniel Sarlette; Wolfgang Henke

doi:10.1117/12.20178

1 June 1990 Assessment of high-contrast G- and I-line resists using high-numerical-aperture exposure tools

Alois Gutmann, Johann Binder, Guenther Czech, Juergen Karl, Leonhard Mader, Daniel Sarlette, Wolfgang Henke

Proceedings Volume 1264, Optical/Laser Microlithography III; (1990) https://doi.org/10.1117/12.20178
Event: Microlithography '90, 1990, San Jose, CA, United States

Abstract

Tests of several high contrast g- and i-line resists furnish data with respect to the resolution limit focus and exposure latitudes thermal stability and Dill parameters. A g. -line stepper of NA 0. 48 and an i-line stepper of NA 0. 40 were primarily used for exposure to a minor extent a g-line stepper of NA 0. 55. The contributions to the focus budget available under production conditions are discussed. SAMPLE simulations extending NA to 0. 60 in the gline and 0. 50 in the i-line case give latitude trends to be expected in the near future. 1.

Citation Download Citation

Alois Gutmann, Johann Binder, Guenther Czech, Juergen Karl, Leonhard Mader, Daniel Sarlette, and Wolfgang Henke "Assessment of high-contrast G- and I-line resists using high-numerical-aperture exposure tools", Proc. SPIE 1264, Optical/Laser Microlithography III, (1 June 1990); https://doi.org/10.1117/12.20178

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