Paper
3 September 1999 Impact testing of silicon-micromachined beams
Chung-Hoon Lee, Ville Kaajakari, Amit Lal
Author Affiliations +
Proceedings Volume 3875, Materials and Device Characterization in Micromachining II; (1999) https://doi.org/10.1117/12.360482
Event: Symposium on Micromachining and Microfabrication, 1999, Santa Clara, CA, United States
Abstract
Anisotropically etched silicon structures were impacted against stainless steel to measure relative impact strength of different silicon surface treatments. In order to study the effects of surface treatment, the beams were coated with thermal silicon dioxide, LPCVD silicon nitride, and silicon dioxide/silicon nitride sandwich. A jig was made to controllably impact the sample and also measure the stresses during impact. It was found that silicon-dioxide treatment resulted in the highest strength structures and the nitride coated samples being weaker than even the uncoated sample. An explanation based on surface stress effect on crack initiation is presented.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Chung-Hoon Lee, Ville Kaajakari, and Amit Lal "Impact testing of silicon-micromachined beams", Proc. SPIE 3875, Materials and Device Characterization in Micromachining II, (3 September 1999); https://doi.org/10.1117/12.360482
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KEYWORDS
Silicon

Semiconducting wafers

Etching

Low pressure chemical vapor deposition

Neck

Ultrasonics

Oxides

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