Paper
30 July 2002 Characterization of a projection lens using the extended Nijboer-Zernike approach
Peter Dirksen, Joseph J. M. Braat, Peter De Bisschop, Guido C.A.M. Janssen, Casper A. H. Juffermans, Alvina M. Williams
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Abstract
In this paper we give the proof of principle of a new experimental method to determine the aberrations of an optical system in the field. The measurement is based on the observation of the intensity point spread function of the lens. To analyze and interpret the measurement, use is made of an analytical method, the so-called extended Nijboer-Zernike approach. The new method is applicable to lithographic projection lenses, but also to EUV mirror systems or microscopes such as the objective lens of an optical mask inspection tool. Phase retrieval is demonstrated both analytically and experimentally. Theory and experimental results are given.
© (2002) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Peter Dirksen, Joseph J. M. Braat, Peter De Bisschop, Guido C.A.M. Janssen, Casper A. H. Juffermans, and Alvina M. Williams "Characterization of a projection lens using the extended Nijboer-Zernike approach", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474523
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CITATIONS
Cited by 7 scholarly publications.
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KEYWORDS
Point spread functions

Monochromatic aberrations

Phase retrieval

Lithography

Microscopes

Photomasks

Reticles

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