Automated Wafer Inspector Characterization

Karl L. Harris; Raleigh Estrada Jr.; Paul Sandland; Russ M. Singleton

doi:10.1117/12.947758

23 July 1985 Automated Wafer Inspector Characterization

Karl L. Harris, Raleigh Estrada Jr., Paul Sandland, Russ M. Singleton

Proceedings Volume 0538, Optical Microlithography IV; (1985) https://doi.org/10.1117/12.947758
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

Several specific aspects of a new multi-functional automatic wafer inspection system are discussed and characterization data presented. Li-near dimensional measurement data are presented illustrating system precision and accuracy. The probability of detecting different types of defects is presented for two different pixel sizes. A new method of providing a design or CAD reference, one of three alternative references, is shown.

Citation Download Citation

Karl L. Harris, Raleigh Estrada Jr., Paul Sandland, and Russ M. Singleton "Automated Wafer Inspector Characterization", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); https://doi.org/10.1117/12.947758

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