Template manufacturing for nanoimprint lithography using existing infrastructure

Mathias Irmscher; Joerg Butschke; Guenter Hess; Florian Letzkus; Markus Renno; Holger Sailer; Hubert Schulz; Anatol Schwersenz; Ecron Thompson; Boris Vratzov

doi:10.1117/12.629974

7 November 2005 Template manufacturing for nanoimprint lithography using existing infrastructure

Mathias Irmscher, Joerg Butschke, Guenter Hess, Florian Letzkus, Markus Renno, Holger Sailer, Hubert Schulz, Anatol Schwersenz, Ecron Thompson, Boris Vratzov

Author Affiliations +

Proceedings Volume 5992, 25th Annual BACUS Symposium on Photomask Technology; 59922E (2005) https://doi.org/10.1117/12.629974
Event: SPIE Photomask Technology, 2005, Monterey, California, United States

Abstract

An initial Nanoimprint template manufacturing process using a state-of-the-art mask front end line has been developed. The process flow is based on conventional 6025 photomask blanks and known basic process steps for chrome and quartz etching. While these etching processes have been slightly adapted, a comprehensive investigation of chemically amplified resists for this purpose was done. We were able to identify a pre-commercial pCAR enabling to approach the 50nm dense line resolution using the Leica SB350 variable shaped beam e-beam writer. We characterized profile, CD-linearity, CD-uniformity and placement accuracy of the nanoimprint templates. The final imprinting of different pattern proved the applicability of the manufactured stamps for the nanoimprint technology.

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Mathias Irmscher, Joerg Butschke, Guenter Hess, Florian Letzkus, Markus Renno, Holger Sailer, Hubert Schulz, Anatol Schwersenz, Ecron Thompson, and Boris Vratzov "Template manufacturing for nanoimprint lithography using existing infrastructure", Proc. SPIE 5992, 25th Annual BACUS Symposium on Photomask Technology, 59922E (7 November 2005); https://doi.org/10.1117/12.629974

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