Evaluation of maskless electron beam direct writing with double character projection apertures

Y. Midoh; T. Terasaka; K. Nakamae

doi:10.1117/12.846461

1 April 2010 Evaluation of maskless electron beam direct writing with double character projection apertures

Y. Midoh, T. Terasaka, K. Nakamae

Proceedings Volume 7637, Alternative Lithographic Technologies II; 76370D (2010) https://doi.org/10.1117/12.846461
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

In this paper, we propose and evaluate maskless electron beam direct writing (EBDW) with double character projection (CP) apertures. In the conventional CP-capable EBDW, the first aperture generates a square beam and the second aperture finalizes the complex character shape. In our proposed method, each aperture has complex character patterns. The double CP apertures system projects circuit patterns onto a wafer by the combined use of two apertures. We present a novel pattern writing algorithm for double CP apertures, especially a generation/merging method of character patterns. The experimental results on ITC'99 benchmark circuit b19 synthesized with Nangate 45nm Open Cell Library showed that throughput of the proposed method was enhanced up to 147.3% of the variable-shaped beam method and up to 117.5% of the conventional CP method.

Citation Download Citation

Y. Midoh, T. Terasaka, and K. Nakamae "Evaluation of maskless electron beam direct writing with double character projection apertures", Proc. SPIE 7637, Alternative Lithographic Technologies II, 76370D (1 April 2010); https://doi.org/10.1117/12.846461

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