Prof. Koji Nakamae
SPIE Involvement:
Author
Publications (20)

Proceedings Article | 26 March 2019 Presentation + Paper
Proceedings Volume 10959, 109590B (2019) https://doi.org/10.1117/12.2515152
KEYWORDS: Image processing, Scanning electron microscopy, Image quality, Line edge roughness, Line width roughness, Image enhancement, Mathematical modeling, Signal to noise ratio, Data modeling

SPIE Journal Paper | 20 December 2018
Minoru Harada, Yohei Minekawa, Fumihiko Fukunaga, Koji Nakamae
JM3, Vol. 17, Issue 04, 044004, (December 2018) https://doi.org/10.1117/12.10.1117/1.JMM.17.4.044004
KEYWORDS: Overlay metrology, Scanning electron microscopy, Image segmentation, Sensors, Image processing, Semiconducting wafers, Detection and tracking algorithms, Electron beams, Signal to noise ratio, Lithography

Proceedings Article | 28 March 2014 Paper
Yoshihiro Midoh, Atsushi Osaki, Koji Nakamae
Proceedings Volume 9049, 90491Z (2014) https://doi.org/10.1117/12.2046336
KEYWORDS: Metals, Electron beam direct write lithography, Dielectrics, Reliability, Lithography, Copper, Electron beams, Electron beam lithography, Resistance, Dielectric breakdown

Proceedings Article | 28 May 2013 Paper
Naoki Fukuda, Shota Sakaguchi, Koji Nakamae
Proceedings Volume 8749, 87490L (2013) https://doi.org/10.1117/12.2015643
KEYWORDS: Quantum communications, Ions, Quantum circuits, Quantum computing, Quantum information, Device simulation, Databases, Detection and tracking algorithms, Clocks, Computing systems

Proceedings Article | 26 March 2013 Paper
Yoshihiro Midoh, Atsushi Osaki, Koji Nakamae
Proceedings Volume 8680, 86801B (2013) https://doi.org/10.1117/12.2011694
KEYWORDS: Reliability, Electron beam direct write lithography, Dielectrics, Electron beams, Copper, Lithography, Dielectric breakdown, Electron beam lithography, Photomasks, Maskless lithography

Showing 5 of 20 publications
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