Driving the industry towards a consensus on high numerical aperture (high-NA) extreme ultraviolet (EUV)

Patrick A. Kearney; Obert Wood; Eric Hendrickx; Greg McIntyre; Soichi Inoue; Frank Goodwin; Stefan Wurm; Jan van Schoot; Winfried Kaiser

doi:10.1117/12.2048397

17 April 2014 Driving the industry towards a consensus on high numerical aperture (high-NA) extreme ultraviolet (EUV)

Patrick A. Kearney, Obert Wood, Eric Hendrickx, Greg McIntyre, Soichi Inoue, Frank Goodwin, Stefan Wurm, Jan van Schoot, Winfried Kaiser

Author Affiliations +

Proceedings Volume 9048, Extreme Ultraviolet (EUV) Lithography V; 90481O (2014) https://doi.org/10.1117/12.2048397
Event: SPIE Advanced Lithography, 2014, San Jose, California, United States

Abstract

High numerical aperture (high-NA) extreme ultraviolet (EUV) is one option to enable a higher resolution than EUV can achieve with single patterning. An industry effort to achieve consensus on the key parameters of high-NA EUV is described. At high-NA, three-dimensional (3D) mask effects cause a loss of contrast in the image that is recovered by increasing the scanner de-magnification. This leads to a tradeoff between wafer field and mask size that has considerable impact on mask cost and scanner cost of ownership.

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Patrick A. Kearney, Obert Wood, Eric Hendrickx, Greg McIntyre, Soichi Inoue, Frank Goodwin, Stefan Wurm, Jan van Schoot, and Winfried Kaiser "Driving the industry towards a consensus on high numerical aperture (high-NA) extreme ultraviolet (EUV)", Proc. SPIE 9048, Extreme Ultraviolet (EUV) Lithography V, 90481O (17 April 2014); https://doi.org/10.1117/12.2048397

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