Spectral emission properties of a LPP light source in the sub-200nm range for wafer inspection applications

Nadia Gambino; Bob Rollinger; Duane Hudgins; Reza Abhari; F. Abreau

doi:10.1117/12.2085806

19 March 2015 Spectral emission properties of a LPP light source in the sub-200nm range for wafer inspection applications

Nadia Gambino, Bob Rollinger, Duane Hudgins, Reza Abhari, F. Abreau

Author Affiliations +

Proceedings Volume 9424, Metrology, Inspection, and Process Control for Microlithography XXIX; 942418 (2015) https://doi.org/10.1117/12.2085806
Event: SPIE Advanced Lithography, 2015, San Jose, California, United States

Abstract

In this work, the spectral emission proprieties of a droplet-based laser-produced plasma are investigated in the VUV range. These studies are performed with a spectrograph operating from 30 nm to 180 nm at a spectral resolution of 0.1 nm. The emission spectra are recorded for different droplet-based metal fuels such as tin, indium and gallium in the presence of different background gas pressure levels. The experimental results are relevant for alternative light sources that would be needed for future wafer inspection tools. In addition, the experimental results help to determine the Out- Of-Band (OOB) radiation emission of the EUV source. By tuning the type of fuel, the laser energies and the background gas, the LPP light source shows good capabilities to be operated as a tunable light source that covers a spectral emission range from the EUV to the sub-200 nm range.

Citation Download Citation

Nadia Gambino, Bob Rollinger, Duane Hudgins, Reza Abhari, and F. Abreau "Spectral emission properties of a LPP light source in the sub-200nm range for wafer inspection applications ", Proc. SPIE 9424, Metrology, Inspection, and Process Control for Microlithography XXIX, 942418 (19 March 2015); https://doi.org/10.1117/12.2085806

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KEYWORDS

Plasma

Vacuum ultraviolet

Gallium

Tin

Light sources

Indium

Inspection

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