Directed Self Assembly (DSA) compliant flow with immersion lithography: from material to design and patterning

Yuansheng Ma; Yan Wang; James Word; Junjiang Lei; Joydeep Mitra; J. Andres Torres; Le Hong; Germain Fenger; Daman Khaira; Moshe Preil; Lei Yuan; Jongwook Kye; Harry J. Levinson

doi:10.1117/12.2219505

22 March 2016 Directed Self Assembly (DSA) compliant flow with immersion lithography: from material to design and patterning

Yuansheng Ma, Yan Wang, James Word, Junjiang Lei, Joydeep Mitra, J. Andres Torres, Le Hong, Germain Fenger, Daman Khaira, Moshe Preil, Lei Yuan, Jongwook Kye, Harry J. Levinson

Author Affiliations +

Proceedings Volume 9777, Alternative Lithographic Technologies VIII; 97770N (2016) https://doi.org/10.1117/12.2219505
Event: SPIE Advanced Lithography, 2016, San Jose, California, United States

Abstract

In this paper, we present a DSA compliant flow for contact/via layers with immersion lithography assuming the grapho-epitaxy process for cylinders’ formation. We demonstrate that the DSA technology enablement needs co-optimization among material, design, and lithography. We show that the number of DSA grouping constructs is countable for the gridded-design architecture. We use Template Error Enhancement Factor (TEEF) to choose DSA material, determine grouping design rules, and select the optimum guiding patterns. Our post-pxOPC imaging data shows that it is promising to achieve 2-mask solution with DSA for the contact/via layer using 193i at 5nm node.

Citation Download Citation

Yuansheng Ma, Yan Wang, James Word, Junjiang Lei, Joydeep Mitra, J. Andres Torres, Le Hong, Germain Fenger, Daman Khaira, Moshe Preil, Lei Yuan, Jongwook Kye, and Harry J. Levinson "Directed Self Assembly (DSA) compliant flow with immersion lithography: from material to design and patterning", Proc. SPIE 9777, Alternative Lithographic Technologies VIII, 97770N (22 March 2016); https://doi.org/10.1117/12.2219505

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