Yan Wang
at Photon Dynamics Inc An Orbotech Co
SPIE Involvement:
Author
Publications (9)

Proceedings Article | 13 March 2009 Paper
Proceedings Volume 7275, 72750T (2009) https://doi.org/10.1117/12.813448
KEYWORDS: Critical dimension metrology, Transistors, Lithography, Immersion lithography, Diffusion, Lens design, Design for manufacturability, Field programmable gate arrays, Design for manufacturing

Proceedings Article | 4 March 2008 Paper
Jonathan Ho, Yan Wang, Xin Wu, Jane Soward, Ping Zhang, Joanne Wu
Proceedings Volume 6925, 69250V (2008) https://doi.org/10.1117/12.771427
KEYWORDS: Transistors, Diffusion, Optical proximity correction, Lithography, Semiconducting wafers, Oscillators, Etching, Standards development, Model-based design, Scanning electron microscopy

SPIE Journal Paper | 1 October 2007
Yan Wang, Jeffrey Bokor
JM3, Vol. 6, Issue 04, 043009, (October 2007) https://doi.org/10.1117/12.10.1117/1.2816449
KEYWORDS: Head, Liquids, Inkjet technology, Microfluidics, Silicon, Printing, Video, Imaging systems, Satellites, Resistance

SPIE Journal Paper | 1 July 2007
Jonathan Ho, Yan Wang, Joanne Wu, Ya-Ching Hou, Ke-Chih Wu
JM3, Vol. 6, Issue 03, 031008, (July 2007) https://doi.org/10.1117/12.10.1117/1.2781584
KEYWORDS: Optical proximity correction, Design for manufacturability, Lithography, Design for manufacturing, Metals, Scanning electron microscopy, Semiconducting wafers, Holmium, Calibration, Integrated circuit design

Proceedings Article | 21 March 2007 Paper
Yan Wang, Jonathan Ho, Benjamin Lin, C.-L. Lin, Y.-C. Sheng, Yoyi Gong, Steven Hsu, Kechih Wu
Proceedings Volume 6521, 65211S (2007) https://doi.org/10.1117/12.712392
KEYWORDS: Data modeling, Calibration, Scanning electron microscopy, Critical dimension metrology, Lithography, Optical proximity correction, Cadmium, Semiconducting wafers, Process modeling, Optical calibration

Showing 5 of 9 publications
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