Wafer scale direct nanoimprinted  high index inorganic (slanted) gratings for AR

Marc A. Verschuuren; Jeroen Visser; Rob Voorkamp

doi:10.1117/12.2577298

27 March 2021 Wafer scale direct nanoimprinted high index inorganic (slanted) gratings for AR

Marc A. Verschuuren, Jeroen Visser, Rob Voorkamp

Proceedings Volume 11765, Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) II; 117650C (2021) https://doi.org/10.1117/12.2577298
Event: SPIE AR VR MR, 2021, Online Only

Abstract

Substrate Conformal Imprint Lithography (SCIL) solves the limitations of PDMS soft-stamp NIL techniques (resolution, pattern deformation, overlay) and allows low-pressure wafer scale conformal contact and sub-10 nm resolution using a novel silicone rubber stamp. SCIL showed direct replication of sub-50nm patterns in silica over 200mm wafers with stamp lifetimes over 500 imprints, for AR, NIL resist with an index of up to n=1.96 and overcoat layers of up to n=2.1. Replication of slanted grating patterns in multiple orientations over the wafer are possible. First results of full 300mm wafer imprints will be shared.

Conference Presentation

Citation Download Citation

Marc A. Verschuuren, Jeroen Visser, and Rob Voorkamp "Wafer scale direct nanoimprinted high index inorganic (slanted) gratings for AR", Proc. SPIE 11765, Optical Architectures for Displays and Sensing in Augmented, Virtual, and Mixed Reality (AR, VR, MR) II, 117650C (27 March 2021); https://doi.org/10.1117/12.2577298

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KEYWORDS

Semiconducting wafers

Nanoimprint lithography

Silica

Silicon

Lithography

Optical lithography

Overlay metrology

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