SCIL nanoimprint: wafer scale overlay alignment and single nm reproductibility by Fourrier scatterometry

Marc A. Verschuuren; Teun Nevels; Mohammad Ramezani; Jeroen Visser; Rob Voorkamp

doi:10.1117/12.2583654

22 February 2021 SCIL nanoimprint: wafer scale overlay alignment and single nm reproductibility by Fourrier scatterometry

Marc A. Verschuuren, Teun Nevels, Mohammad Ramezani, Jeroen Visser, Rob Voorkamp

Author Affiliations +

Proceedings Volume 11610, Novel Patterning Technologies 2021; 1161009 (2021) https://doi.org/10.1117/12.2583654
Event: SPIE Advanced Lithography, 2021, Online Only

Abstract

Substrate Conformal Imprint Lithography (SCIL) solves the limitations of PDMS soft-stamp based NIL techniques (resolution, pattern deformation, overlay) and allows low-pressure wafer scale conformal contact and sub-10 nm resolution using a novel silicone rubber stamp. SCIL demonstrated direct replication of sub-50nm patterns in silica over 200mm wafers with stamp lifetimes over 500 imprints. (Moxtek, NNT 2019) The evaluation of patterns on wafer scale is usually done by SEM or AFM, and not amendable to inline inspection. We will demonstrate a novel compact optical quality inspection method for nanophotonic components, based on Fourier microscopy (imaging the back-focal plane of objective lens). In combination with inverse modeling, we reach few-nanometer precision for periodic structures.

Conference Presentation

Citation Download Citation

Marc A. Verschuuren, Teun Nevels, Mohammad Ramezani, Jeroen Visser, and Rob Voorkamp "SCIL nanoimprint: wafer scale overlay alignment and single nm reproductibility by Fourrier scatterometry", Proc. SPIE 11610, Novel Patterning Technologies 2021, 1161009 (22 February 2021); https://doi.org/10.1117/12.2583654

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