Mr. Atsushi Ueno Profile

Atsushi Ueno

at Renesas Technology Corp

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Publications (6)

Proceedings Article | 24 May 2004 Paper

Improved overlay metrology device correlation on 90-nm logic processes

Atsushi Ueno, Kouichirou Tsujita, Hiroyuki Kurita, Yasuhisa Iwata, Mark Ghinovker, Jorge Poplawski, Elyakim Kassel, Mike Adel

Proceedings Volume 5375, (2004) https://doi.org/10.1117/12.534522

KEYWORDS: Overlay metrology, Personal protective equipment, Scanning electron microscopy, Metrology, Scanners, Lithography, Optical design, Metals, Semiconducting wafers, Monochromatic aberrations

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Proceedings Article | 26 June 2003 Paper

Simple and highly sensitive focus monitoring utilizing an aperture on backside of photomask

Shuji Nakao, Junjirou Sakai, Shinroku Maejima, Atsushi Ueno, Akihiro Nakae, Shigenori Yamashita, Ken-ichi Itano, Hidehiko Kozawa, Akira Tokui, Kouichirou Tsujita

Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485324

KEYWORDS: Photomasks, Semiconducting wafers, Chromium, Modulation, Overlay metrology, Monochromatic aberrations, Geometrical optics, Double patterning technology, Quartz, Wafer-level optics

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Proceedings Article | 30 July 2002 Paper

Simple focus monitoring by eccentric illumination aperture

Shuji Nakao, Shinroku Maejima, Naohisa Tamada, Shigenori Yamashita, Atsushi Ueno, Junji Miyazaki, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474625

KEYWORDS: Semiconducting wafers, Photomasks, Overlay metrology, Imaging systems, Projection systems, Double patterning technology, Wafer-level optics, Printing, Diffraction, Calibration

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Proceedings Article | 30 July 2002 Paper

Implementation of phase-shift focus monitor with modified illumination

Shuji Nakao, Shinroku Maejima, Atsushi Ueno, Shigenori Yamashita, Junji Miyazaki, Akira Tokui, Kouichirou Tsujita, Ichiriou Arimoto

Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474643

KEYWORDS: Chromium, Semiconducting wafers, Phase shifts, Printing, Photomasks, Diffraction, Monochromatic aberrations, Wafer-level optics, Silicon, Sodium

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Proceedings Article | 5 July 2000 Paper

Improvement of CD control and resolution by optimizing inorganic ARC process

Atsumi Yamaguchi, Atsushi Ueno, Kouichirou Tsujita

Proceedings Volume 4000, (2000) https://doi.org/10.1117/12.389086

KEYWORDS: Etching, Critical dimension metrology, Oxides, Reflectivity, Photoresist processing, Dry etching, Photomasks, Lithography, Silicon, Bottom antireflective coatings

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Proceedings Article | 26 July 1999 Paper

Effect of negative-tone mask lithography on lens aberration phenomena

Kouichirou Tsujita, Yuuji Yamauchi, Atsushi Ueno, Wataru Wakamiya, Tadashi Nishimura

Proceedings Volume 3679, (1999) https://doi.org/10.1117/12.354350

KEYWORDS: Lithography, Photomasks, Lithographic illumination, Monochromatic aberrations, Critical dimension metrology, Image processing, Photoresist processing, Transistors, Semiconducting wafers, Optical proximity correction

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Showing 5 of 6 publications

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