Mr. Christoph Reuter Profile

Christoph Reuter

at Technische Univ. Ilmenau

SPIE Involvement:

Author

Publications (6)

Proceedings Article | 25 May 2022 Presentation + Paper

Nanofabrication and -metrology by using the nanofabrication machine (NFM-100)

Ingo Ortlepp, Jaqueline Stauffenberg, Anja Krötschl, Denis Dontsov, Jens-Peter Zöllner, Steffen Hesse, Christoph Reuter, Steffen Strehle, Thomas Fröhlich, Ivo Rangelow, Eberhard Manske

Proceedings Volume 12054, 120540A (2022) https://doi.org/10.1117/12.2615118

KEYWORDS: Nanofabrication, Control systems, Atomic force microscopy, Optical lithography, Interferometers, Inspection, Scanning probe lithography, Interferometry, System integration

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Proceedings Article | 22 February 2021 Presentation + Paper

Nanopositioning and -fabrication using the Nano Fabrication Machine with a positioning range up to Ø 100 mm

Jaqueline Stauffenberg, Christoph Reuter, Ingo Ortlepp, Mathias Holz, Denis Dontsov, Christoph Schäffel, Jens-Peter Zöllner, Ivo Rangelow, Steffen Strehle, Eberhard Manske

Proceedings Volume 11610, 1161016 (2021) https://doi.org/10.1117/12.2583703

KEYWORDS: Nanofabrication, Wheatstone bridges, Statistical analysis, Sensors, Precision measurement, Optical sensors, Nanotechnology, Nanostructures, Manufacturing, Lithography

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Proceedings Article | 26 September 2019 Paper

Atomic force microscope integrated into a scanning electron microscope for fabrication and metrology at the nanometer scale

Mathias Holz, Christoph Reuter, Alexander Reum, Ahmad Ahmad, Martin Hofmann, Tzvetan Ivanov, Stephan Mechold, Ivo Rangelow

Proceedings Volume 11148, 111481F (2019) https://doi.org/10.1117/12.2537018

KEYWORDS: Scanning electron microscopy, Atomic force microscope, Electron microscopes, Metrology, Electron beams, Nanofabrication, Diamond, Scanning probe lithography, Microscopy, Overlay metrology

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Proceedings Article | 26 September 2019 Paper

High throughput AFM inspection system with parallel active cantilevers

M. Holz, C. Reuter, A. Reum, A. Ahmad, M. Hofmann, T. Ivanov, I. Rangelow, J. Stauffenberg, E. Manske, C. Du, X. Q. Zhou, N. Okamoto, A. N. Takashima, H. S. Lee

Proceedings Volume 11148, 111481E (2019) https://doi.org/10.1117/12.2537009

KEYWORDS: Inspection, Atomic force microscopy, Chemical mechanical planarization, Actuators, Metrology, Semiconductors, Optical inspection, Charged particle optics, Electron beams, Photomasks

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Proceedings Article | 26 March 2019 Paper

Parallel active cantilever AFM tool for high-throughput inspection and metrology

Mathias Holz, Christoph Reuter, Ahmad Ahmad, Alexander Reum, Tzvetan Ivanov, Elshad Guliyev, Ivo Rangelow, Ho-Se Lee

Proceedings Volume 10959, 1095929 (2019) https://doi.org/10.1117/12.2515091

KEYWORDS: Metrology, Atomic force microscopy, Inspection, Semiconducting wafers, Actuators, Photomasks, Silicon, Digital signal processing, Field programmable gate arrays, Imaging systems

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Proceedings Article | 19 March 2018 Presentation + Paper

Field-emission scanning probe lithography with self-actuating and self-sensing cantilevers for devices with single digit nanometer dimensions

Ivo Rangelow, Claudia Lenk , Martin Hofmann , Steve Lenk , Tzvetan Ivanov , Ahmad Ahmad , Marcus Kaestner, Elshad Guliyev, Christoph Reuter, Matthias Budden, Jens-Peter Zöllner, Mathias Holz , Alexander Reum, Zahid Durrani, Mervyn Jones, Cemal Aydogan, Mahmut Bicer, B. Erdem Alaca, Michael Kuehnel, Thomas Fröhlich, Roland Fuessl, E. Manske

Proceedings Volume 10584, 1058406 (2018) https://doi.org/10.1117/12.2299955

KEYWORDS: Silicon, Lithography, Etching, Scanning probe lithography, Cryogenics, Optical alignment, Nanoelectronics, Reactive ion etching, Nanolithography, Electron beam lithography

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Showing 5 of 6 publications

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