Mr. Gerd Ballhorn Profile

Gerd Ballhorn

at Infineon Technologies AG

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Author

Publications (6)

Proceedings Article | 28 May 2003 Paper

Compensation of long-range process effects on photomasks by design data correction

Martin Bloecker, Gerd Ballhorn, Jens Schneider, Nikola Belic, Hans Eisenmann, Danny Keogan

Proceedings Volume 5148, (2003) https://doi.org/10.1117/12.515122

KEYWORDS: Critical dimension metrology, Etching, Photomasks, Data corrections, Data modeling, Dry etching, Convolution, Chromium, Plasma etching, Chlorine

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Proceedings Article | 27 December 2002 Paper

Compensation of long-range process effects on photomasks by design data correction

Jens Schneider, Martin Bloecker, Gerd Ballhorn, Nikola Belic, Hans Eisenmann, Danny Keogan

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467572

KEYWORDS: Critical dimension metrology, Etching, Data corrections, Photomasks, Dry etching, Data modeling, Convolution, Plasma etching, Chromium, Computed tomography

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Proceedings Article | 27 December 2002 Paper

Advanced and highly reliably distributed computing in a fully automated environment

Gerd Ballhorn, Martin Bloecker, Danny Keogan, Peter Moberts

Proceedings Volume 4889, (2002) https://doi.org/10.1117/12.467917

KEYWORDS: Computed tomography, Sun, Vestigial sideband modulation, Control systems, Explosives, Data processing, Computer aided design, Beam shaping, Data conversion, Distributed computing

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Proceedings Article | 1 August 2002 Paper

Design flow automation for variable-shaped beam pattern generators

Martin Bloecker, Gerd Ballhorn

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476937

KEYWORDS: Computed tomography, Beam shaping, Raster graphics, Data conversion, Photomasks, Silver, Vestigial sideband modulation, Sun, Optical proximity correction, Electron beams

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Proceedings Article | 11 March 2002 Paper

Slashing turnaround-time by introducing distributed computing

Gerd Ballhorn

Proceedings Volume 4562, (2002) https://doi.org/10.1117/12.458291

KEYWORDS: Computed tomography, Data conversion, Sun, Distributed computing, Vestigial sideband modulation, Optical proximity correction, Local area networks, Beam shaping, Photomasks, Data communications

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Proceedings Article | 22 January 2001 Paper

Mask manufacturing rule check: how to save money in your mask shop

Martin Keck, Wolfram Ziegler, Roman Liebe, Torsten Franke, Gerd Ballhorn, Matthias Koefferlein, Joerg Thiele

Proceedings Volume 4186, (2001) https://doi.org/10.1117/12.410681

KEYWORDS: Inspection, Photomasks, Manufacturing, Optical proximity correction, Inspection equipment, Computed tomography, Detection and tracking algorithms, Bridges, Tungsten, Silver

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Showing 5 of 6 publications

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