Dr. Jue-Chin Yu Profile

Dr. Jue-Chin Yu

at Taiwan Semiconductor Manufacturing Co Ltd

SPIE Involvement:

Author

Publications (9)

Proceedings Article | 30 April 2023 Presentation

Curvilinear mask: bridging ILT to HVM

Danping Peng, Shang-Jung Wu, Jue-Chin Yu, Chia-Hua Chang, Kenneth Ho

Proceedings Volume 12495, 124950I (2023) https://doi.org/10.1117/12.2661726

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Data processing, Lithography, Inspection, Image processing

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Proceedings Article | 13 March 2012 Paper

Source optimization incorporating margin image average with conjugate gradient method

Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao

Proceedings Volume 8326, 83261W (2012) https://doi.org/10.1117/12.916597

KEYWORDS: Image acquisition, Photomasks, Mathematical modeling, Optimization (mathematics), Electro optical modeling, Source mask optimization, Spatial frequencies, Optical lithography, Linear filtering, Resolution enhancement technologies

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SPIE Journal Paper | 1 October 2011

Wavefront-based pixel inversion algorithm for generation of subresolution assist features

Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao

JM3, Vol. 10, Issue 04, 043014, (October 2011) https://doi.org/10.1117/12.10.1117/1.3663249

KEYWORDS: Photomasks, SRAF, Optical proximity correction, Wavefronts, Nanoimprint lithography, Lithography, Chaos, Image segmentation, Diffraction, Resolution enhancement technologies

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Proceedings Article | 23 March 2011 Paper

Gradient-based fast source mask optimization (SMO)

Jue-Chin Yu, Peichen Yu

Proceedings Volume 7973, 797320 (2011) https://doi.org/10.1117/12.879441

KEYWORDS: Source mask optimization, Molybdenum, Resolution enhancement technologies, Photomasks, Spatial frequencies, Lithography, Optical lithography, Image acquisition, Optical proximity correction, Photoresist materials

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Proceedings Article | 23 March 2011 Paper

Choosing objective functions for inverse lithography patterning

Jue-Chin Yu, Peichen Yu

Proceedings Volume 7973, 79731N (2011) https://doi.org/10.1117/12.879440

KEYWORDS: Photomasks, Optical lithography, Lithography, Optical proximity correction, Photoresist materials, SRAF, Superposition, Manufacturing, Resolution enhancement technologies, Wavefronts

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Proceedings Article | 4 March 2010 Paper

Fast-converging iterative gradient decent methods for high pattern fidelity inverse mask design

Jue-Chin Yu, Peichen Yu

Proceedings Volume 7640, 76402L (2010) https://doi.org/10.1117/12.846568

KEYWORDS: Photomasks, Optical proximity correction, Lithography, Optimization (mathematics), Optical lithography, Integrated optics, Optics manufacturing, Integrated circuits, Semiconducting wafers, Lithographic illumination

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Proceedings Article | 12 December 2009 Paper

Fast converging inverse lithography algorithm incorporating image gradient descent methods

Jue-Chin Yu, Peichen Yu

Proceedings Volume 7520, 75200V (2009) https://doi.org/10.1117/12.837514

KEYWORDS: Binary data, Photomasks, Optical proximity correction, Lithography, Algorithm development, Image processing, Manufacturing, Projection systems, Diffraction, Image quality

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Proceedings Article | 16 March 2009 Paper

Innovative pixel-inversion calculation for model-based sub-resolution assist features and optical proximity correction

Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao

Proceedings Volume 7274, 72743B (2009) https://doi.org/10.1117/12.814413

KEYWORDS: SRAF, Optical proximity correction, Wavefronts, Model-based design, Photomasks, Manufacturing, Image segmentation, Solids, Optimization (mathematics), Lithography

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Proceedings Article | 4 December 2008 Paper

Model-based sub-resolution assist features using an inverse lithography method

Jue-Chin Yu, Peichen Yu, Hsueh-Yung Chao

Proceedings Volume 7140, 714014 (2008) https://doi.org/10.1117/12.804678

KEYWORDS: SRAF, Photomasks, Wavefronts, Optical proximity correction, Lithography, Model-based design, Image segmentation, Manufacturing, Resolution enhancement technologies, Image enhancement

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Showing 5 of 9 publications

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